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Structural and electrical characterization of AgInS2 thin films grown by single-source thermal evaporation method

机译:单源热蒸发法制备AgInS2薄膜的结构和电学表征

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Structural and electrical properties of AgInS2 (AIS) thin films grown by single-source thermal evaporation method were studied. The X-ray diffraction spectra indicated that the AIS single phase was successfully grown by annealing above 400 degrees C in air. The grain size of the AIS crystals was above 2.5 mu m from the surface photograph. Furthermore, the AIS grain sizes became large with increasing the annealing temperatures. All the samples indicated n-type conduction by the Van der Pauw technique. The carrier concentrations and the resistivities of the AIS films at room temperature were in the range of 10(19)-10(22) cm(-3) and 10(-1)-10(-3) Omega cm, respectively. Therefore the mobilities increased from 0.6 to 6.0 cm(2)/Vs with increasing the grain sizes. (C) 2005 Springer Science + Business Media, Inc.
机译:研究了单源热蒸发法制备的AgInS2(AIS)薄膜的结构和电学性质。 X射线衍射光谱表明,AIS单相通过在空气中高于400℃退火而成功生长。根据表面照片,AIS晶体的晶粒尺寸大于2.5μm。此外,随着退火温度的升高,AIS晶粒尺寸变大。所有样品均通过范德堡技术显示出n型导电性。室温下AIS薄膜的载流子浓度和电阻率分别在10(19)-10(22)cm(-3)和10(-1)-10(-3)Omega cm范围内。因此,随着晶粒尺寸的增加,迁移率从0.6增至6.0 cm(2)/ Vs。 (C)2005年Springer Science + Business Media,Inc.

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