首页> 外文期刊>Journal of Materials Science. Materials in Electronics >Effects of high temperature electron irradiation on trench-IGBT
【24h】

Effects of high temperature electron irradiation on trench-IGBT

机译:高温电子辐照对沟槽式IGBT的影响

获取原文
获取原文并翻译 | 示例
       

摘要

The degradation of the electrical properties of IGBTs (Insulated-Gate Bipolar Transistors) by 2-MeV electron irradiation at high-temperatures was studied. The irradiation temperatures were 25, 100, 200 and 300 degrees C, and the fluence was fixed at 10(15) e/cm(2). For most experimental conditions, the threshold voltage (V-TH) is observed to recover partially during 100 degrees C and the saturation voltage (V-CEsat) increase is most pronounced at 100 degrees C. It is shown that in this irradiation temperature range, the temperature dependency of the voltage shift due to the radiation-induced interface traps (Delta V-it) and the voltage shift due to the radiation-induced oxide traps (Delta V-ot) are different, which suggests a possible degradation mechanism for these phenomena. It is tentatively suggested that the diffusion of hydrogen released from the gate by the 2-MeV electrons passivates the interface traps during the high temperature irradiation. (C) 2005 Springer Science + Business Media, Inc.
机译:研究了2-MeV电子在高温下对IGBT(绝缘栅双极晶体管)的电性能的影响。辐照温度为25、100、200和300摄氏度,注量固定为10(15)e / cm(2)。在大多数实验条件下,观察到阈值电压(V-TH)在100摄氏度时会部分恢复,而饱和电压(V-CEsat)的升高在100摄氏度时最为明显。表明,在此照射温度范围内,辐射引起的界面陷阱引起的电压漂移的温度依赖性(Delta V-it)和辐射引起的氧化物陷阱引起的电压漂移的温度依赖性(Delta V-ot)是不同的,这提示了它们可能的降解机理现象。初步提出,在高温辐照期间,由2-MeV电子从栅极释放的氢的扩散会钝化界面陷阱。 (C)2005年Springer Science + Business Media,Inc.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号