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首页> 外文期刊>Journal of materials science >Characterisation of n-type γ-CuCl on Si for UV optoelectronic applications
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Characterisation of n-type γ-CuCl on Si for UV optoelectronic applications

机译:用于紫外光电应用的Si上n型γ-CuCl的表征

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摘要

The use of co-evaporation of ZnCl_2 with CuCl in order to achieve n-type conductivity in CuCl is reported herein. Linear current-voltage (IV) characteristics in the range of ±4 V have been measured using Cu-Au electrical contacts. Room temperature Hall effect measurements show some evidence of a mixed conduction mechanism. On average the samples exhibit n-type conductivity with a bulk electron carrier concentration n ~1 × 10~(16) cm~(-3) and Hall mobility μ ~ 29 cm~2v~(-1)s~(-1) for a CuCl sample doped with a nominal 3 mole % ZnCl_2. By use of an in situ CaF_2 capping layer, transmission > 90% is achieved. At room temperature a strong Z_3 free excitonic emission occurs at ~385 nm using both photoluminescence and x-ray excitedrnoptical luminescence, indicating the high optical quality of the doped material.
机译:本文报道了ZnCl 2与CuCl的共蒸发以在CuCl中实现n型电导率的用途。使用Cu-Au电触点已测量出±4 V范围内的线性电流-电压(IV)特性。室温霍尔效应测量结果显示了混合传导机制的一些证据。平均而言,样品表现出n型电导率,体电子载流子浓度为n〜1×10〜(16)cm〜(-3),霍尔迁移率μ〜29 cm〜2v〜(-1)s〜(-1)掺杂了标称3摩尔%ZnCl_2的CuCl样品。通过使用原位CaF_2覆盖层,可以实现90%以上的透射率。在室温下,同时使用光致发光和X射线激发的正态发光,在〜385 nm处会发生强烈的Z_3自由激子发射,表明掺杂材料的光学质量很高。

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