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Preparation and optical properties of Bi doped ZnO thin films with (100) orientation by rf magnetron sputtering

机译:射频磁控溅射制备(100)取向Bi掺杂ZnO薄膜及其光学性能

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摘要

Bi doped ZnO films with (100) orientation have been grown on glass substrates by rf magnetron sputtering followed by vacuum annealing at 400 ℃ for 3 h. X-ray diffraction (XRD) revealed that the film first growth along (002) direction was suppressed to form (100) plane with c-axis parallel to the substrate. After annealed at 400 ℃ for 3 h under vacuum, transmittance about 80% in visible region and near 100% absorption in UV region for (100) oriented Bi doped ZnO films are confirmed by the optical transmission spectra. The optical band gap is evaluated to be around 3.13 eV which is lower than (002) oriented films.
机译:通过射频磁控溅射,然后在400℃下真空退火3 h,在玻璃基板上生长了(100)取向的Bi掺杂的ZnO薄膜。 X射线衍射(XRD)表明,沿(002)方向的膜的第一生长被抑制以形成c轴平行于基板的(100)面。在100℃取向的Bi掺杂的ZnO薄膜中于400℃真空退火3 h后,可见光区的透射率约为80%,紫外区的吸收率接近100%。光学带隙估计为约3.13 eV,低于(002)取向膜。

著录项

  • 来源
    《Journal of materials science》 |2009年第10期|972-976|共5页
  • 作者

    Minhong Jiang; Xinyu Liu;

  • 作者单位

    Department of Information Material Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, People's Republic of China College of Material Science and Engineering, Central South University, Changsha 410083, People's Republic of China;

    Department of Information Material Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, People's Republic of China College of Material Science and Engineering, Central South University, Changsha 410083, People's Republic of China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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