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Structural, optical and electrical characteristics of transparent bismuth vanadate films deposited on indium tin oxide coated glass substrates

机译:沉积在氧化铟锡涂层玻璃基板上的透明钒酸铋薄膜的结构,光学和电学特性

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摘要

Bismuth vanadate (BVO) thin films were fabricated on indium tin oxide (ITO) coated glass substrates using pulsed laser ablation technique and investigated their structural, optical and electrical properties. The use of the indium tin oxide coated glass substrate resulted in reducing the leakage current characteristics of crystalline BVO thin films. The X-ray diffraction (XRD) studies confirmed the monophasic nature of the post annealed (500 ℃/1 h) films. The atomic force microscopy indicated the homogeneous distribution of crystallites in the as-deposited films. The as-deposited and the post annealed films were almost 90% transparent (380-900 nm) as confirmed by optical transmission studies. Dielectric constant of around 52 was attained accompanied by the low dielectric loss of 0.002 at 10 kHz for post annealed films. The leakage current of the post annealed BVO films on ITO coated glass substrates measured at room temperature was 8.1 × 10~(-8) A at an applied electric field of 33 kV/cm, which was lower than that of the films with platinum and SrRuO_3 as the bottom electrodes.
机译:使用脉冲激光烧蚀技术在氧化铟锡(ITO)涂覆的玻璃基板上制备了钒酸铋(BVO)薄膜,并研究了它们的结构,光学和电学性质。氧化铟锡涂覆的玻璃基板的使用导致结晶的BVO薄膜的漏电流特性降低。 X射线衍射(XRD)研究证实了退火后(500℃/ 1 h)薄膜的单相性质。原子力显微镜检查表明在沉积的薄膜中微晶均匀分布。如通过光学透射研究所证实的,沉积后的膜和退火后的膜几乎是90%透明的(380-900nm)。对于后退火的膜,介电常数达到约52,同时在10 kHz时具有0.002的低介电损耗。在33 kV / cm的施加电场下,室温下测得的ITO涂层玻璃基板上的退火后BVO膜的泄漏电流为8.1×10〜(-8)A,低于带铂和铂的膜的漏电流。 SrRuO_3作为底部电极。

著录项

  • 来源
    《Journal of materials science》 |2010年第11期|p.1107-1114|共8页
  • 作者单位

    Materials Research Center, Indian Institute of science, Bangalore 560012, India;

    rnMaterials Research Center, Indian Institute of science, Bangalore 560012, India;

    rnMaterials Research Center, Indian Institute of science, Bangalore 560012, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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