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首页> 外文期刊>Journal of materials science >Photoelectrochemically active surfactant free single step hydrothermal mediated titanium dioxide nanorods
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Photoelectrochemically active surfactant free single step hydrothermal mediated titanium dioxide nanorods

机译:无光电化学活性的表面活性剂单步水热介导的二氧化钛纳米棒

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摘要

Titanium dioxide (TiO_2) nanorods have been successfully synthesized by a simple and cost-effective hydrothermal deposition method onto the conducting glass substrates. Effect of reaction temperature on the growth of TiO_2 nanorods have been investigated by varying the reaction temperature from 140 to 200 ℃. The optical, structural, compositional, morphological properties of the synthesized films are studied. X-ray diffraction patterns reveal the formation of polycrystalline TiO_2 with the tetragonal crystal structure possessing rutile phase. The chemical composition and valence states of the constituent elements were analysed by X-ray photoelectron spectros-copy. Field emission scanning electron microscopy images shows the formation of nanorod-like structure with variation in diameter. The optical band gap energy was found to increase from 3.07 to 3.15 eV with the increase in reaction temperature exhibiting a blue shift. The films were photo electrochemically active with the maximum current density of 216 μA/cm~2 for the sample prepared at 180 ℃.
机译:通过简单且经济高效的水热沉积方法已成功地在导电玻璃基板上合成了二氧化钛(TiO_2)纳米棒。通过将反应温度从140℃改变为200℃,研究了反应温度对TiO_2纳米棒生长的影响。研究了合成膜的光学,结构,组成和形态学性质。 X射线衍射图谱显示形成具有金红石相的四方晶体结构的多晶TiO_2。通过X射线光电子能谱分析了构成元素的化学组成和化合价态。场发射扫描电子显微镜图像显示出直径变化的纳米棒状结构的形成。发现随着反应温度的增加,蓝带能带隙能从3.07增加到3.15eV。在180℃下制备的样品具有电化学活性,最大电流密度为216μA/ cm〜2。

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  • 来源
    《Journal of materials science 》 |2014年第10期| 4501-4511| 共11页
  • 作者单位

    Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, Maharashtra, India;

    Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan, ROC;

    Department of Materials Science and Engineering, Chonnam National University, Gwangju 500 757, South Korea;

    Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, Maharashtra, India;

    Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, Maharashtra, India;

    School of Applied Chemical Engineering, Chonnam National University, Gwangju 500 757, South Korea;

    Department of Physics, National Dong Hwa University, Hualien 97401, Taiwan, ROC;

    Department of Materials Science and Engineering, Chonnam National University, Gwangju 500 757, South Korea;

    School of Applied Chemical Engineering, Chonnam National University, Gwangju 500 757, South Korea;

    Thin Film Materials Laboratory, Department of Physics, Shivaji University, Kolhapur 416 004, Maharashtra, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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