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Thickness dependence and magnetization behavior of Mn-doped GeTe phase change materials

机译:Mn掺杂GeTe相变材料的厚度依赖性和磁化行为

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摘要

In this paper, the thickness dependences of microstructural, magnetic and electrical properties of Mn-doped GeTe phase change magnetic thin films were studied. The X-ray diffraction patterns demonstrate that the as-deposited films with difference thickness are amorphous while the annealed films are polycrystalline. The crystal-lographic structure investigation shows that the dominant orientation is enhanced with increasing thickness. The lattice parameters of Mn-doped GeTe thin films as function of the thickness were calculated. The grain sizes increase with the films thickness while the full width at half maximum, plane distance and the lattice strain decrease. The temperature dependences of magnetizations of all the films show that the maximum magnetization values occur at the lowest temperature. The data analysis results of the field cooling magnetization showed that Mn-doped GeTe films have the ferromagnetic ordering at T_C = 48, 97 and 110 K for film with thickness 60, 120 and 200 nm respectively. It was found that the resistivity decreases from 12.6 to 0.863 mΩ cm as the film thickness increases from 60 to 200 nm.
机译:本文研究了Mn掺杂GeTe相变磁性薄膜的微观结构,磁学和电学性质的厚度依赖性。 X射线衍射图表明,具有不同厚度的沉积膜是非晶的,而退火膜是多晶的。晶体学结构研究表明,主取向随厚度增加而增强。计算了Mn掺杂GeTe薄膜的晶格参数随厚度的变化。晶粒尺寸随着膜厚度的增加而增加,而半峰全宽,平面距离和晶格应变减小。所有膜的磁化强度与温度的关系表明,最大磁化值出现在最低温度下。场冷磁化的数据分析结果表明,掺杂Mn的GeTe薄膜在厚度分别为60、120和200 nm的薄膜上的T_C分别为48、97和110K。发现随着膜厚度从60nm增加到200nm,电阻率从12.6减小到0.863mΩcm。

著录项

  • 来源
    《Journal of materials science 》 |2015年第7期| 5202-5208| 共7页
  • 作者单位

    School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China,Wuhan National Laboratory for Optoelectronics, Wuhan 430074, China,Faculty of Science and Technology, Alneelain University, Khartoum 11121, Sudan;

    School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China,Wuhan National Laboratory for Optoelectronics, Wuhan 430074, China;

    School of Optical and Electronic Information, Huazhong University of Science and Technology, Wuhan 430074, China,Wuhan National Laboratory for Optoelectronics, Wuhan 430074, China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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