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Phase Change Materials on Metals: Crystallization Behavior and Applications in Magnetic Stacks.

机译:金属上的相变材料:结晶行为及其在磁性叠层中的应用。

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摘要

In this thesis we will show that the activation energies for crystallization of phase change (PC) materials on various sputtered metal surfaces are all similar (Ru, TiW, Pt, and Fe), and are similar to oxide reference surfaces (i.e. thermally oxidized Si wafers). Additionally, the crystallization temperature on the sputtered metals was typically lower than on these reference surfaces. The principle difference between the metals and the oxide reference surfaces, however, does not appear to be the metal/oxide difference. Sputtered oxide films behave more like the metals in this study, suggesting that the effect is due to roughness or some other feature of the sputtered films. Film thickness appears to be a more important feature in determining kinetics than the nature of the PC interface. Experiments with thin Ge2Sb2Te 5 (GST) layers sandwiched between metals show a rather dramatic increase in crystallization temperature with decreasing thickness. These results are similar to literature experiments with GST sandwiched in between dielectrics. As a result, it was concluded that the presence of metal electrodes does not significantly alter GST crystallization behavior as compared to dielectric bounding materials.;In a separate set of experiments, it was found that Ru and TiW were reasonable diffusion barriers for phase change materials during crystallization. Their efficacies as diffusion barriers were determined by a novel method using the reduction of magnetization of Fe as an indicator of the extent of the diffusion. This was also corroborated with XPS depth studies. Ru and TiW were found to be good diffusion barriers at low temperatures (300 °C) but diffusion was found to occur at higher temperatures (460 °C). In comparison, significant interdiffusion was found for Pt samples at all temperatures.;Coupling experiments suggest that there is a very weak antiferromagnetic coupling when using Ru/amorphous GST/Ru composite spacers between magnetic films. This antiferromagnetic coupling is reduced when depositing crystalline GST. However, due to the thinness of the GST spacers (< 3 nm) required and the contradictory change in coupling with excimer laser pulsing, this effect cannot be proven to be unambiguously due to the crystallization or amorphization of the GST. As for magnetoresistive effects, two different phenomena were found to occur in layered magnetic structures separated with PC spacer layers: 1) granular MR and 2) spin valve MR. Both effects are much smaller than conventional MR, and so do not appear to have obvious technological application at this time. Granular MR occurs only for CoFe samples, with no such effect occurring for the Fe samples, and can be enhanced to a maximum value of 0.19% after annealing. Annealing appears to produce a microstructure consistent with granular MR, in which coupled magnetic regions are separated by non-magnetic phase change regions. The annealing process in this case enhances the granularization without causing crystallization of the phase change. As for the spin valve MR, values of MR for Ru/10 nm GST/Ru sandwiched between layers of Fe and FePt were observed to be 0.006 %, increasing to 0.008 % (1.3 X increase) concurrent with the crystallization process. This behavior is ascribed to the increase in the mean free path of the GST upon crystallization.;In summary, the role of metal boundary materials has been found to be similar to dielectrics in terms of crystallization kinetics of phase change materials. Interdiffusion is a separate issue that must be addressed when metals are in contact with PC materials, and Ru appears to be promising in this respect. Thin layers between metals show the same increase in activation energy that they show between dielectrics and this constitutes a major challenge for magnetic stack applications where a very thin PC layers might produce novel device properties. Both magnetic coupling between layers separated by phase change and GMR-like magnetoresistance with PC spacers has been shown in this work. However, the effects are small and may be challenging to increase due the need for diffusion barriers and the need for a minimum PC layer thickness within the spacer stack to permit reversible phase change. (Abstract shortened by UMI.).
机译:在本文中,我们将证明在各种溅射金属表面上用于相变(PC)材料结晶的活化能都相似(Ru,TiW,Pt和Fe),并且与氧化物参考表面(即热氧化Si)相似。晶片)。另外,溅射金属上的结晶温度通常低于这些参考表面上的结晶温度。然而,金属与氧化物参考表面之间的原理差异似乎不是金属/氧化物差异。在本研究中,溅射的氧化膜的行为更像金属,表明该效果是由于溅射膜的粗糙度或其他某些特征所致。膜厚似乎是决定动力学的重要特征,而不是PC界面的性质。夹在金属之间的Ge2Sb2Te 5(GST)薄层的实验表明,随着厚度的减小,晶化温度显着提高。这些结果类似于将GST夹在电介质之间的文献实验。结果表明,与电介质粘结材料相比,金属电极的存在不会显着改变GST的结晶行为。在另一组实验中,发现Ru和TiW是相变材料的合理扩散阻挡层在结晶过程中。通过将铁的磁化强度的降低作为扩散程度的指标的新颖方法,确定了它们作为扩散阻挡层的效率。 XPS深度研究也证实了这一点。发现Ru和TiW在低温(300°C)下是良好的扩散阻挡层,但发现在较高温度(460°C)下发生扩散。相比之下,在所有温度下都发现Pt样品之间存在明显的相互扩散。耦合实验表明,在磁性膜之间使用Ru /非晶GST / Ru复合垫片时,反铁磁耦合非常弱。沉积晶体GST时,这种反铁磁耦合会降低。但是,由于所需的GST间隔物很薄(<3 nm)以及与受激准分子激光脉冲耦合产生的矛盾变化,因此,由于GST的结晶或非晶化,不能证明这种效果是明确的。至于磁阻效应,在用PC隔离层隔开的分层磁性结构中发现了两种不同的现象:1)颗粒状MR和2)自旋阀MR。两种效果都比常规MR小得多,因此目前似乎没有明显的技术应用。颗粒状MR仅在CoFe样品中发生,而在Fe样品中则没有这种影响,退火后可以提高到最大值0.19%。退火似乎产生与粒状MR一致的微观结构,其中耦合的磁性区域被非磁性相变区域分开。在这种情况下的退火过程增强了颗粒化而不会引起相变的结晶。对于自旋阀MR,观察到夹在Fe和FePt层之间的Ru / 10nm GST / Ru的MR值是0.006%,在结晶过程的同时增加到0.008%(增加1.3倍)。这种行为归因于结晶时GST的平均自由程的增加。总之,在相变材料的结晶动力学方面,发现金属边界材料的作用类似于电介质。相互扩散是金属与PC材料接触时必须解决的一个独立问题,Ru在这方面似乎很有前途。金属之间的薄层显示出与电介质之间相同的活化能增加,这对磁性堆叠应用构成了主要挑战,在磁性堆叠应用中,非常薄的PC层可能会产生新颖的器件性能。这项工作显示了通过相变分隔的层之间的磁耦合以及具有PC垫片的GMR状磁阻。然而,由于需要扩散阻挡层以及在间隔件堆叠内需要最小的PC层厚度以允许可逆相变,因此效果很小并且可能难以增加。 (摘要由UMI缩短。)。

著录项

  • 作者

    Huang, Jiancheng.;

  • 作者单位

    Carnegie Mellon University.;

  • 授予单位 Carnegie Mellon University.;
  • 学科 Engineering Electronics and Electrical.;Physics Solid State.;Engineering Materials Science.
  • 学位 Ph.D.
  • 年度 2012
  • 页码 140 p.
  • 总页数 140
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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