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Structural and optical investigation of Cd_4Se_(96-x)S_x (x = 4, 8, 12) chalcogenide thin films

机译:Cd_4Se_(96-x)S_x(x = 4,8,12)硫族化物薄膜的结构和光学研究

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摘要

Cd_4Se_(96-x)S_x with x = 4, 8, 12 chalcogenide semiconductor has been prepared by melt-quenching technique. Thin films were deposited by thermal evaporation technique on ultra clean glass substrates under a high vacuum of 10~(-6) Torr and were characterized by XRD, SEM, FTIR and Raman spectroscopy. XRD confirms the prepared films are in nanoscale region having polycrys-talline nature with preferred orientation along (002) plan. Optical properties (optical band gap, absorption coefficient, extinction coefficient, refractive index) were investigated in the frequency range of 190-1100 nm. Analysis of the optical measurement shows that the non-direct transition is dominant. It is observed that the optical band gap increase with sulfur (S) concentration. The Dark conductivity as a function of temperature in the temperature range 300-390 K was investigated, which shows that it is thermally activated process. The conductivity increases on the incorporation of Sulfur content, which may be due to shift in Fermi level.
机译:通过熔融淬火技术制备了具有x = 4、8、12的硫属化物半导体的Cd_4Se_(96-x)S_x。通过热蒸发技术将薄膜沉积在10〜(-6)Torr高真空下的超净玻璃基板上,并通过XRD,SEM,FTIR和拉曼光谱进行表征。 XRD证实所制备的膜在具有多晶-talline性质的纳米级区域中,具有沿(002)平面的优选取向。在190-1100 nm的频率范围内研究了光学性能(光学带隙,吸收系数,消光系数,折射率)。光学测量的分析表明,非直接跃迁占主导。观察到光学带隙随硫(S)浓度的增加而增加。研究了在300-390 K温度范围内暗电导率随温度变化的函数,表明它是热激活过程。电导率随着硫含量的增加而增加,这可能是由于费米能级的变化。

著录项

  • 来源
    《Journal of materials science》 |2015年第7期|4816-4822|共7页
  • 作者

    Mohsin Ganaie; M. Zulfequar;

  • 作者单位

    Department of Physics, Jamia Millia Islamia, New Delhi 110025, India;

    Department of Physics, Jamia Millia Islamia, New Delhi 110025, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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