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Surface evolution of sputtered Cu(In,Ga)Se_2 thin films under various annealing temperatures

机译:不同退火温度下溅射Cu(In,Ga)Se_2薄膜的表面演变

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摘要

In this work, copper indium gallium selenide (CIGS) thin films were prepared by sputtering CIGS quaternary target and subsequent annealing under Se atmosphere in the 240-550 ℃ range. X-ray diffraction (XRD), Grazing incidence x-ray diffraction (GIXRD), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were performed to investigate the crystalline structures and chemical compositions of the CIGS thin films. According to XRD, GIXRD and Raman analyses, the CIGS phase was splitted into CuSe phase and In_4Se_3 phase at the very surface when CIGS was annealed at 240 and 270 ℃. In addition, XRD patterns indicated a grain size growth with increasing temperature. XPS analyses contributed more information on the film surface chemistry. Indeed, O 1 s and Na 1 s signals were observed at the film surface above 380 ℃, and were even increased from 450 to 550 ℃. Simultaneously, the surface appeared to exhibit a Cu and Ga poor surface chemical composition. The strong correlation between O, Na and Cu atomic contents in the CIGS surface were discussed in the paper.
机译:在这项工作中,铜铟镓硒(CIGS)薄膜是通过溅射CIGS四元靶,然后在240-550℃的Se气氛下退火而制备的。通过X射线衍射(XRD),掠入射X射线衍射(GIXRD),拉曼光谱和X射线光电子能谱(XPS)研究了CIGS薄膜的晶体结构和化学组成。根据XRD,GIXRD和Raman分析,当CIGS在240和270℃退火时,CIGS相在最表面分裂为CuSe相和In_4Se_3相。另外,XRD图谱表明晶粒尺寸随温度升高而增长。 XPS分析为薄膜表面化学提供了更多信息。实际上,在380℃以上的薄膜表面观察到O 1 s和Na 1 s信号,甚至从450℃增加到550℃。同时,表面似乎表现出较差的Cu和Ga表面化学组成。本文讨论了CIGS表面中O,Na和Cu原子含量之间的强相关性。

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  • 来源
    《Journal of materials science 》 |2015年第7期| 4840-4847| 共8页
  • 作者单位

    School of Physics, Beijing Institute of Technology, Beijing 100081, China,Institut des Materiaux Jean Rouxel (IMN), Universite de Nantes, UMR CNRS 6502, 44322 Nantes, France;

    School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China;

    School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China;

    School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China;

    School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China;

    School of Materials Science and Engineering, Tsinghua University, Beijing 100084, China;

    College of Materials Science and Engineering, Hunan University, Changsha 410082, China,Institut des Materiaux Jean Rouxel (IMN), Universite de Nantes, UMR CNRS 6502, 44322 Nantes, France;

    Institut des Materiaux Jean Rouxel (IMN), Universite de Nantes, UMR CNRS 6502, 44322 Nantes, France;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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