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首页> 外文期刊>Journal of materials science >A Substantial linear red shift in the band gap in heavily copper doped zinc oxide thin films produced by co-sputtering
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A Substantial linear red shift in the band gap in heavily copper doped zinc oxide thin films produced by co-sputtering

机译:通过共溅射制备的重掺杂铜的氧化锌薄膜中的带隙发生线性大红移

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摘要

Zinc oxide is a wide band gap semiconductor that has found potential applications in ultraviolet optoelectronics. Its utilization in the visible range necessitates its energy gap be reduced and tunable. Here, this is achieved by doping ZnO thin films with copper via a co-sputtering technique, where the ZnO was radio-frequency sputtered and the copper was DC-sputtered. The copper concentration was controlled through the DC power applied to the copper target, where concentrations up to 51 at.% were attained indicating heavy doping. The resulting films exhibited large absorption in the visible range with a considerable red shift in the band gap approaching a value of 0.57 eV compared to pure ZnO.
机译:氧化锌是一种宽带隙半导体,已在紫外光电子学中发现了潜在的应用。它在可见光范围内的利用需要减小其能隙并进行可调。在这里,这是通过共溅射技术用铜掺杂ZnO薄膜实现的,其中ZnO进行了射频溅射,而铜进行了DC溅射。铜浓度是通过施加到铜靶上的直流电源来控制的,该浓度达到了51at。%,表明重掺杂。与纯ZnO相比,所得薄膜在可见光范围内显示出大吸收,带隙中有相当大的红移,接近0.57 eV。

著录项

  • 来源
    《Journal of materials science》 |2017年第17期|12956-12961|共6页
  • 作者单位

    Physics Department, King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia;

    Physics Department, King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia;

    Physics Department, King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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