机译:Sn_(1_x)Fe_xO_2薄膜的结构,光学和室温铁磁性能的快速蒸发技术
Thin Films Laboratory, Centre for Crystal Growth, VIT University, Vellore 632014, Tamilnadu, India;
Thin Films Laboratory, Centre for Crystal Growth, VIT University, Vellore 632014, Tamilnadu, India;
Thin Films Laboratory, Centre for Crystal Growth, VIT University, Vellore 632014, Tamilnadu, India;
Thin Films Laboratory, Centre for Crystal Growth, VIT University, Vellore 632014, Tamilnadu, India;
Department of Electronics and Radio Engineering, Kyung Hee University, Yongin-si, Gyeonggi-do 441-701, South Korea;
Department of Physics and Sungkyukwan Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwan 440746, Korea;
机译:衬底温度和退火对真空闪蒸沉积纳米CdS薄膜结构和光学性能的影响
机译:厚度对改性给料机蒸发蒸发法制备的ZnS薄膜结构和光学性能的影响。
机译:衬底温度对闪蒸CuIn_(0.8)Al_(0.19)Se_2薄膜的结构,光学和电学性质的影响
机译:通过闪光蒸发技术制备的SN_(1-X)Fe_XO_2薄膜的结构和光学性质
机译:铁磁InMnAs薄膜及其合金的光学和磁光特性。
机译:低真空度热蒸发法制备a-Se薄膜的结构光学和X射线响应特性研究
机译:闪蒸制备In2S3薄膜的结构和光学性质