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Hydrothermal synthesis of Zn-doped Ni-Mn-AI-O thin films toward high-performance negative temperature coefficient thermistor

机译:高性能负温度系数热敏电阻的水热合成Zn掺杂Ni-Mn-Al-O薄膜

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摘要

In this study, Zn-doped Ni–Mn–Al–O negative temperature coefficient thermistor (NTC) film with high electrical performance has been demonstrated. XRD, XPS, SEM and electrical measurements were carried out to explore the impact of Zn-doping. The XRD analysis of NiMn~(1.8−x)Al~(0.2)Zn~(x)O~(4)films confirmed the cubic spinel crystal phase regardless of x. The SEM image illustrated that the morphology of NiMn~(1.8−x)Al~(0.2)Zn~(x)O~(4)is closely related to the Zn doping amount. The XPS showed that the relative molar content of Mn_(3+)and Mn_(4+)increased with the increase of Zn doping concentration. Remarkably, the Zn-doped Ni–Mn–Al–O film presented the typical NTC characteristics, and the room temperature resistance (R~(25)) increased with the improvement in Zn doping concentration. Moreover, the thermistor constant B~(25/50)remained reasonably high from 4088 to 4272 K. Meanwhile, the aging test showed that the Zn-doped films were more stable, even aging at 150 °C for 500 h.
机译:在这项研究中,已证明具有高电性能的Zn掺杂Ni-Mn-Al-O负温度系数热敏电阻(NTC)膜。进行了XRD,XPS,SEM和电学测量,以探讨锌掺杂的影响。 NiMn〜(1.8-x)Al〜(0.2)Zn〜(x)O〜(4)薄膜的XRD分析证实了立方尖晶石晶相与x无关。 SEM图像表明,NiMn〜(1.8-x)Al〜(0.2)Zn〜(x)O〜(4)的形态与Zn的掺杂量密切相关。 XPS分析表明,随着Zn掺杂浓度的增加,Mn_(3+)和Mn_(4+)的相对摩尔含量增加。值得注意的是,Zn掺杂的Ni–Mn–Al–O薄膜具有典型的NTC特性,并且室温电阻(R〜(25))随着Zn掺杂浓度的提高而增加。此外,热敏电阻常数B〜(25/50)在4088至4272K之间保持较高的值。同时,老化测试表明,掺杂Zn的薄膜更稳定,甚至在150°C下老化500h。

著录项

  • 来源
    《Journal of materials science》 |2018年第11期|9025-9032|共8页
  • 作者单位

    Ningxia University;

    Ningxia University;

    Ningxia University;

    Ningxia University;

    Ningxia University;

    Ningxia University;

    School of Materials Science and Engineering, Beifang University of Nationalities;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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