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Electron transport within the wurtzite and zinc-blende phases of gallium nitride and indium nitride

机译:氮化镓和氮化铟的纤锌矿和闪锌矿相内的电子传输

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AbstractWide energy gap semiconductors are broadly recognized as promising materials for novel electronic and opto-electronic device applications. As informed device design requires a firm grasp on the material properties of the underlying electronic materials, the electron transport that occurs within the wide energy gap semiconductors has been the focus of considerable study over the years. In an effort to provide some perspective on this rapidly evolving and burgeoning field of research, we review analyzes of the electron transport within some wide energy gap semiconductors of current interest in this paper. In order to narrow the scope of this review, we will primarily focus on the electron transport that occurs within the wurtzite and zinc-blende phases of gallium nitride and indium nitride in this review, these materials being of great current interest to the wide energy gap semiconductor community; indium nitride, while not a wide energy gap semiconductor in of itself, is included as it is often alloyed with other wide energy gap semiconductors, the resultant alloy often being a wide energy gap semiconductor itself. The electron transport that occurs within zinc-blende gallium arsenide will also be considered, albeit primarily for bench-marking purposes. Most of our discussion will focus on results obtained from our ensemble semi-classical three-valley Monte Carlo simulations of the electron transport within these materials, our results conforming with state-of-the-art wide energy gap semiconductor orthodoxy. A brief tutorial on the Monte Carlo electron transport simulation approach, this approach being used to generate the results presented herein, will also be provided. Steady-state and transient electron transport results are presented. The evolution of the field, a survey of the current literature, and some applications for the results presented herein, will also be featured. We conclude our review by presenting some recent developments on the electron transport within these materials. This review is the latest in a series of reviews that have been published on the electron transport processes that occur within the class of wide energy semiconductor materials. The results and references have been updated to include the latest developments in this rapidly evolving field of study.
机译: Abstract 宽能隙半导体被广泛认为是用于新型电子和光电子的有希望的材料。电子设备应用程序。由于明智的设备设计需要牢牢把握基础电子材料的材料特性,因此,多年来在宽能隙半导体中发生的电子传输一直是研究的重点。为了对这个迅速发展和迅速发展的研究领域提供一些见解,我们在本文中回顾了对当前感兴趣的一些宽能隙半导体中电子传输的分析。为了缩小本综述的范围,在本综述中,我们将主要关注在氮化镓和氮化铟的纤锌矿和闪锌矿相中发生的电子传输,这些材料对于宽能隙具有重大的当前意义。半导体社区;氮化铟虽然本身不​​是宽能隙半导体,但因为它经常与其他宽能隙半导体形成合金,所以被包括在内,所得合金通常是宽能隙半导体本身。也将考虑在闪锌矿砷化镓中发生的电子传输,尽管主要是为了进行基准测试。我们大部分的讨论将集中于对这些材料中电子传输的整体半经典三谷蒙特卡罗模拟得出的结果,我们的结果与最先进的宽能隙半导体正教技术相符。还将提供有关蒙特卡洛电子传输模拟方法的简短教程,该方法用于生成此处介绍的结果。给出了稳态和瞬态电子传输结果。还将介绍该领域的发展,对当前文献的调查以及此处介绍的结果的一些应用。我们通过介绍这些材料中电子传输的一些最新进展来结束我们的综述。这篇评论是一系列有关宽能半导体材料中发生的电子传输过程的最新评论。结果和参考资料已经更新,包括了这个快速发展的研究领域的最新进展。

著录项

  • 来源
    《Journal of materials science》 |2018年第5期|3511-3567|共57页
  • 作者单位

    School of Engineering, The University of British Columbia;

    School of Engineering, The University of British Columbia;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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