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Dependence of Structural and Optoelectrical Properties on the Composition of Electron Beam Evaporated Zn_xCd_(1-x)S Thin Films

机译:结构和光电性能对电子束蒸发Zn_xCd_(1-x)S薄膜组成的影响

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Thin films of Zn_xCd_(1-x)S have been prepared by electron beam evaporation of a mixture of ZnS & CdS powders. The films are deposited onto sodalime glass slides under similar conditions. The composition of the films is varied from CdS to ZnS (x = 0 to 1). The films show a regular change in color from toner red to orange yellow as Zn concentration increases to maximum. These films are characterized for their optical, electrical and structural properties. The bandgap value of Zn_xCd_(1-x)S films is found to vary linearly from 2.20 eV to 3.44 eV with change in the x value from 0 to 1. The resistivity of these films is in the range of 171.0 Ωcm to 5.5 x 10~6 Ωcm for x = 0~0.6. All the samples show cubic structure after annealing in air at 250℃ for 40 min. The lattice constant α_o varies from 0.5884 nm to 0.54109 nm linearly.
机译:Zn_xCd_(1-x)S薄膜是通过电子束蒸发ZnS和CdS粉末的混合物制备的。将膜在类似条件下沉积到钠钙玻璃载玻片上。薄膜的成分从CdS到ZnS不等(x = 0到1)。随着Zn浓度增加到最大值,这些膜显示出从调色剂红色到橙黄色的规则颜色变化。这些薄膜具有光学,电学和结构特性。 Zn_xCd_(1-x)S薄膜的带隙值随x值从0到1的变化从2.20 eV到3.44 eV线性变化。这些薄膜的电阻率在171.0Ωcm到5.5 x 10的范围内x = 0〜0.6时为〜6Ωcm。所有样品在空气中于250℃退火40分钟后均显示立方结构。晶格常数α_o在0.5884nm至0.54109nm之间线性变化。

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