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Structures and properties of (ool)-oriented Pb(zr,Ti)O_3 films on LaNiO_3/Si(ool) substrates by pulsed laser deposition

机译:脉冲激光沉积在LaNiO_3 / Si(ool)衬底上的(ool)取向Pb(zr,Ti)O_3膜的结构和性能

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摘要

In Pb(Zr_0.4Ti_0.6)O_3(PZT) (110-nm-thick) films grown on (ool)-oriented LaNiO_3 (LNO) (50-nm-thick)/Si(ool) films by pulsed laser deposition, the microstructures and various structural properties of the PZT and the underlying LNO films were comparatively studied mainly using synchrotron x-ray scattering experiments.
机译:在通过脉冲激光沉积在(ool)取向的LaNiO_3(LNO)(50 nm厚)/ Si(ool)膜上生长的Pb(Zr_0.4Ti_0.6)O_3(PZT)(110 nm厚)膜中,主要通过同步加速器X射线散射实验比较研究了PZT及其下面的LNO膜的微观结构和各种结构性能。

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