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首页> 外文期刊>Journal of Materials Research >Epitaxial growth of PbZr_0.5ti_0.5O_3 thin films on SrRuO_3/SrTiO_3 substrates using chemical solution Deposition: Microstructural and ferroelectric properties
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Epitaxial growth of PbZr_0.5ti_0.5O_3 thin films on SrRuO_3/SrTiO_3 substrates using chemical solution Deposition: Microstructural and ferroelectric properties

机译:使用化学溶液在SrRuO_3 / SrTiO_3衬底上外延生长PbZr_0.5ti_0.5O_3薄膜沉积:微观结构和铁电性能

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摘要

Epitaxial PbZr_0.5ti_0.5O_3 (PZT) thin films were grown on top of a SrRuO_3 epitaxial electrode layer on a (100) srtiO_3 substrate by the chemical solution deposition methkod at various temperatures. The microstructure of the PZT thin films was investigated by x-ray diffraction and transmission electron microscopy, and the ferroelectric properties were measured using the Ag/PZT/SRO capacitor structure.
机译:通过化学溶液沉积方法在不同温度下,在(100)srtiO_3衬底上的SrRuO_3外延电极层上生长外延PbZr_0.5ti_0.5O_3(PZT)薄膜。通过X射线衍射和透射电子显微镜研究了PZT薄膜的微观结构,并使用Ag / PZT / SRO电容器结构测量了铁电性能。

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