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首页> 外文期刊>Journal of Materials Research >Transmission electron microscopy study of the structure of radio frequency sputter-deposited yttria-stabilized zirconia thin films
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Transmission electron microscopy study of the structure of radio frequency sputter-deposited yttria-stabilized zirconia thin films

机译:射频溅射沉积氧化钇稳定氧化锆薄膜结构的透射电镜研究

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摘要

Transmission electron microscopy (TEM) was used to investigate the structural properties of sputter-deposited yttria-stabilized zirconia (YSZ) thin films. YSZ films were deposited over a range of temperatures and background oxygen levels. Additionally, a multilayered structure was produced by cyclic application of a substrate bias. Plan-view TEM showed that temperature and oxygen levels did not have a significant effect on grain size but did alter the phases present in the thin films. Cross-sectional TEM showed the development of texture in the multilayer film, both within the individual layers and in the entire film.
机译:透射电子显微镜(TEM)用于研究溅射沉积的氧化钇稳定的氧化锆(YSZ)薄膜的结构性能。 YSZ膜在一定温度和背景氧含量范围内沉积。另外,通过循环施加衬底偏压产生多层结构。平面TEM显示,温度和氧气水平对晶粒尺寸没有显着影响,但确实改变了薄膜中存在的相。截面TEM显示出多层膜中的纹理的发展,无论是在单个层中还是在整个膜中。

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