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首页> 外文期刊>Journal of magnetism and magnetic materials >The electromagnetic shielding of Ni films deposited on cenosphere particles by magnetron sputtering method
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The electromagnetic shielding of Ni films deposited on cenosphere particles by magnetron sputtering method

机译:磁控溅射法沉积在微球上的镍膜的电磁屏蔽

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摘要

Ni-coated cenosphere particles were successfully fabricated by an ultrasonic-assisted magnetron sputtering equipment. Their surface morphology and microstructure were analyzed using field emission scanning electron microscopy (FE-SEM) and X-ray diffraction (XRD). FE-SEM results indicate that the Ni films coated by magnetron sputtering are uniform and compact. Ni film uniformity was related with the sputtering power and a large uniform film could be achieved at lower sputtering power. XRD results imply that the Ni film coated on cenospheres was a face-centered cubic (fcc) structure and the crystallization of film sample increases with increasing the sputtering power. The electromagnetic interference (EMI) shielding effectiveness (SE) of Ni-coated cenosphere particles were measured to be 4-27 dB over a frequency range 80-100 GHz, higher than those of uncoated cenosphere particles. The higher sputtering power and Ni film thickness are the higher EMI SE of the specimens. Ni-coated cenosphere particles are most promising alternative candidates for millimeter wave EMI shielding due to their lightweight, low cost, ease of processing, high floating time, good dispersion and tunable conductivities as compared with typical electromagnetic wave countermeasure materials.
机译:通过超声辅助磁控溅射设备成功制备了镀镍的空心球颗粒。使用场发射扫描电子显微镜(FE-SEM)和X射线衍射(XRD)分析了它们的表面形态和微观结构。 FE-SEM结果表明,磁控溅射镀Ni膜均匀,致密。 Ni膜的均匀性与溅射功率有关,在较低的溅射功率下可以获得大的均匀膜。 XRD结果表明,包覆在空心球体上的Ni膜为面心立方(fcc)结构,并且随着溅射功率的增加,膜样品的结晶度增加。在80-100 GHz的频率范围内,镀镍的空心球颗粒的电磁干扰(EMI)屏蔽效率(SE)被测量为4-27 dB,高于未包覆的空心球颗粒。较高的溅射功率和Ni膜厚度表示样品的EMI SE较高。与典型的电磁波对策材料相比,镀镍的空心球颗粒具有重量轻,成本低,易于加工,浮动时间长,分散性好和可调节的电导率等优点,因此是毫米波EMI屏蔽的最有希望的替代材料。

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