...
机译:磁控溅射法沉积在微球上的镍膜的电磁屏蔽
Beijing Key Laboratory for Powder Technology R. & D., Beijing University of Aeronautics and Astronautics, Beijing 100083, PR China China National Academy of Nanotechnology & Engineering, Tianjin 300457, PR China;
Beijing Key Laboratory for Powder Technology R. & D., Beijing University of Aeronautics and Astronautics, Beijing 100083, PR China China National Academy of Nanotechnology & Engineering, Tianjin 300457, PR China;
cenosphere particle; Ni film; magnetron sputtering; electromagnetic interference; shielding effectiveness; millimeter wave;
机译:脉冲磁控溅射法在空心粒子上沉积光催化TiO_2薄膜。
机译:磁控溅射法沉积在空心层粒子上的金属铜膜
机译:磁控溅射法在空心球粒子上包覆铜膜的生长机理
机译:磁控溅射镍膜的AFM研究涂覆在Cenyse粒子上
机译:溅射参数对RF磁控溅射沉积ITO膜的影响
机译:反应堆磁控溅射沉积p型缺铜Cu Cr0.95-xMg0.05 O2薄膜的光电性能
机译:磁控溅射与多极体溅射沉积的Co和Cu薄膜电磁波屏蔽的影响