Electron scattering characteristics of polycrystalline metal transition films by in-situ electrical resistance measurements

摘要

In-situ electrical resistance measurements were performed to obtain the scattering characteristics of very thin polycrystalline metal transition magnetic alloys grown by ion beam deposition (IBD) on specific underlayers. The experimental curves show size effects at small film thicknesses and important differences between Co_(85)Fe_(15) and Ni_(81)Fe_(19) thin layers grown on identical underlayers of Ta70A/Rul3 A. The largest difference was observed in Ni_(81)Fe_(19) films grown on underlayers of amorphous Ta70A. The experimental curves of electrical resistivity/conductivity variation with layer thickness were well fit within the Mayadas and Shatzkes (M-S) model, assuming specific formulations for grain growth with layer thickness.