首页> 外文期刊>Journal of magnetism and magnetic materials >Comparison of the effects of 60 nm and 96 nm thick patterned permalloy thin films on the performance of on-chip spiral inductors
【24h】

Comparison of the effects of 60 nm and 96 nm thick patterned permalloy thin films on the performance of on-chip spiral inductors

机译:比较60 nm和96 nm厚的图案化坡莫合金薄膜对片上螺旋电感器性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

In our earlier work it was shown that the 60 nm domain patterned Permalloy, incorporated on on-chip spiral inductors, gave better performance at frequencies greater than 5 GHz compared to the bulk Permalloy incorporated inductors, and the control structure. In this paper we compare the effects of 60 nm and 96 nm thick domain patterned Permalloy thin films, on the performance of on-chip spiral inductors. Experimental results show that the 60 nm thick both bulk and patterned Permalloys provide more improvement in inductance and quality factor of inductors, compared to that of 96 nm.
机译:在我们较早的工作中,与片内集成的坡莫合金和控制结构相比,片上螺旋电感器上集成的60 nm畴图案化的坡莫合金在大于5 GHz的频率下具有更好的性能。在本文中,我们比较了60 nm和96 nm厚畴图案化的坡莫合金薄膜对片上螺旋电感器性能的影响。实验结果表明,与96 nm相比,厚度为60 nm的块状和图案化的坡莫合金均可提供更大的电感电感和品质因数改善。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号