Simple Two-Photon Inscription of Surface Relief Gratings with Azobenzene Functionalized Polymer

摘要

Two-photon fabrication of surface relief gratings on azobenzene functionalized polymer films was carried out using femtosecond laser pulses at 800 nm. The two-photon inscriptions were achieved by simply employing a relief grating as a phase mask. The relief patterns were successfully recorded with the phase mask and the near-infrared laser pulses. The period of the grating is the same as that of the mask. Polarization dependent formation of the grating was observed.View full textDownload full textKeywordsAzobenzene, femtosecond laser, surface relief grating, phase mask, polarizationRelated var addthis_config = { ui_cobrand: "Taylor & Francis Online", services_compact: "citeulike,netvibes,twitter,technorati,delicious,linkedin,facebook,stumbleupon,digg,google,more", pubid: "ra-4dff56cd6bb1830b" }; Add to shortlist Link Permalink http://dx.doi.org/10.1080/10601325.2011.620438