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Optical properties of high-quality ZnO thin films grown by a sputtering method

机译:通过溅射法生长的高质量ZnO薄膜的光学性质

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We have investigated optical properties of high-quality ZnO thin films grown by a sputtering method. By introducing a low-temperature buffer layer of ZnO, the lattice-misinatched strain is relaxed and the crystallinity is improved remarkably. In the absorption spectrum at 10 K, the absorption peaks of the A and B excitons are observed. In the photo luminescence (PL) spectrum, the free-exciton PL is observed and the defect-related PL is negligibly weak. These results clearly indicate high crystallinity of the film. Furthermore, under high-density excitation conditions, a PL band originating from an inelastic scattering process of excitons, the so-called P emission, is observed in the ZnO thin film. (c) 2004 Elsevier B.V. All rights reserved.
机译:我们已经研究了通过溅射方法生长的高质量ZnO薄膜的光学特性。通过引入ZnO的低温缓冲层,可以缓和晶格失配的应变,并显着提高结晶度。在10 K的吸收光谱中,观察到A和B激子的吸收峰。在光致发光(PL)光谱中,观察到自由激子PL,与缺陷相关的PL可以忽略不计。这些结果清楚地表明了膜的高结晶度。此外,在高密度激发条件下,在ZnO薄膜中观察到源自激子的非弹性散射过程的PL带,即所谓的P发射。 (c)2004 Elsevier B.V.保留所有权利。

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