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首页> 外文期刊>Journal of Lightwave Technology >Design of double-pass electroabsorption modulators with low-voltage, high-speed properties for 40 Gb/s modulation
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Design of double-pass electroabsorption modulators with low-voltage, high-speed properties for 40 Gb/s modulation

机译:具有低电压,高速特性的双通道电吸收调制器的设计,可实现40 Gb / s调制

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We discuss device design for electroabsorption (EA) modulators using a double-pass (DP) configuration to attain low-voltage, high-speed operation for wide-wavelength 40 Gb/s optical intensity modulation. It is important to suppress residual antireflective-coated facet reflectivity R/sub 1/ for the input-output port and on-state propagation loss A/sub bs, on/ in the waveguide for reducing level change variation /spl Delta/ caused by the interference effect. As a result, R/sub 1/>0.5% and A/sub bs, on/>1.5 dB are required to obtain /spl Delta/ less than 1 dB. The most interesting features-reduced drive voltage and improved a figure of merit (bandwidth to drive voltage)-are found theoretically compared to those of conventional a single-pass (SP) configuration. Drive voltage reduction by introducing a DP configuration is clarified: the degree of the reduction is decided by nonlinearity "n" of absorption increase, assuming voltage dependence on increase of the absorption coefficient is proportional to the applied voltage to the n power (V/sup 11/). For the same device length, the drive voltage is decreased to 2/sup -1/ leading up to an improvement of a figure of merit up to 2/sup 1/. We then present experimental results for fabricated devices having an InGaAsP bulk absorption layer showing small interference effect and large improvement of characteristics. Drive voltages reduced to 52-60% are achieved over a SP configuration with the same waveguide length, which is in good agreement with the theoretical expectation of 2/sup -1/. Design window for 40 Gb/s modulation appears by introducing a DP configuration even for devices with a bulk absorber. Proper waveguide length design provides high performance with a low drive voltage /spl sim/1.2 V, a modulation bandwidth over 30 GHz (showing a figure of merit of /spl sim/25 GHz/V), an insertion loss below 8 dB, and a small variation of on-state loss less than 1 dB for wide wavelength range of input light from 1.545 to 1.558 /spl mu/m. An almost twice larger modulation index is confirmed even under a dynamic condition.
机译:我们讨论了使用双通道(DP)配置的电吸收(EA)调制器的设备设计,以实现低电压,高速运行,以实现宽波长40 Gb / s的光强度调制。重要的是抑制波导上/下的输入-输出端口的残留抗反射涂层小平面反射率R / sub 1 /和通态传播损耗A / sub bs,以减小由反射引起的电平变化/ spl Delta /。干扰效应。结果,需要R / sub 1 /> 0.5%和A / sub bs,on /> 1.5 dB才能获得小于1 dB的/ spl Delta /。从理论上讲,与传统的单通(SP)配置相比,最有趣的功能是降低了驱动电压并提高了品质因数(带宽到驱动电压)。阐明了通过引入DP配置降低驱动电压:降低的程度由吸收增加的非线性“ n”决定,假设电压对吸收系数增加的依赖性与施加的n功率成正比(V / sup 11 /)。对于相同的器件长度,驱动电压降低到2 / sup -1 / n /,从而导致品质因数提高到2 / sup 1 / n /。然后,我们介绍具有InGaAsP体吸收层的制造器件的实验结果,该器件显示出小的干涉效应和大的特性改善。在具有相同波导长度的SP配置下,可将驱动电压降低至52-60%,这与2 / sup -1 / n /的理论期望值非常吻合。通过引入DP配置,即使对于带有大容量吸收器的设备,也会出现40 Gb / s调制的设计窗口。适当的波导长度设计可提供高性能,低驱动电压/ spl sim / 1.2 V,超过30 GHz的调制带宽(显示/ spl sim / 25 GHz / V的品质因数),低于8 dB的插入损耗以及对于1.545至1.558 / spl mu / m的宽范围输入光,通态损耗的变化很小,小于1 dB。即使在动态条件下,也可以确认几乎两倍的调制指数。

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