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首页> 外文期刊>Journal of Lightwave Technology >Terahertz/optical mixing in symmetric semiconductor quantum wells embedded in optical microcavities
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Terahertz/optical mixing in symmetric semiconductor quantum wells embedded in optical microcavities

机译:太赫兹/光学混合在光学微腔中嵌入的对称半导体量子阱中

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摘要

A quantum well (QW) in the simultaneous presence of a terahertz field polarized in the growth direction and an incident optical field near an excitonic resonance results in substantial frequency mixing between the terahertz and optical fields. In particular, a response at new frequencies given by the input optical frequency plus or minus multiples of the terahertz frequency occurs-the terahertz sidebands. In a symmetric QW, the dominant contribution to terahertz-sideband formation is the high-frequency modulation of the overlap integral of the relevant conduction- and valence-subband envelope functions that determine the strength of the interband dipole moment. terahertz-sideband generation is shown to be strongly enhanced in a high quality-factor optical microcavity. Numerical values of the reflected intensity into the first terahertz sideband normalized with respect to the reflected intensity at the fundamental as large as /spl sim/10% are estimated. This suggests that terahertz-sideband generation in semiconductor microcavities is a promising option worthy of exploration for wavelength conversion for wavelength-division multiplexing applications.
机译:在同时存在沿生长方向极化的太赫兹场和接近激子共振的入射光场的量子阱(QW)导致太赫兹和光场之间发生大量的频率混合。特别地,在由输入光频率加上或减去太赫兹频率的倍数给定的新频率处出现了太赫兹边带。在对称QW中,对太赫兹边带形成的主要贡献是对相关的导带和价子带包络函数的重叠积分的高频调制,这些调制决定了带间偶极矩的强度。太赫兹边带的产生在高品质因数的光学微腔中得到了显着增强。估计相对于基波上的反射强度归一化为/ spl sim / 10%大的第一太赫兹边带的反射强度的数值。这表明在半导体微腔中产生太赫兹边带是一个有前途的选择,值得探索用于波分复用应用的波长转换。

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