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A design of low leakage cache memory cell for high performance processors

机译:用于高性能处理器的低泄漏高速缓存存储单元设计

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摘要

The noises, when augmented with leakage, destabilize the data stored in cache (SRAM). So, a novel TT cache memory cell with reduced leakages and improved read and write performance is proposed to address the mentioned issue. The proposed cell with its unique read assist circuit provides SNM-free read operation. It also provides improved write ability by performing a differential write operation. The performance of the proposed cell is compared with the Standard-6T and Dual-V_T 7T (DVT-7T) cells at 32nm technology node in the subthreshold region by SPICE simulations. The proposed structure shows significant improvement over other cells in terms of Read Static Noise Margin (RSNM), Write Static Noise Margin (VVSNM), Data Retention Voltage (DRV), critical write time (T_(crit)), read current (I_(read)) and standby leakage current (I_(leak)) values. In addition it uses three MOS transistor based latch structure to reduce area overhead. The Proposed-7T structure improves RSNM, WSNM, Iread and Ileak over Standard-6T cell. Similarly, performance improvement is observed in RSNM, WSNM, I_(read), T_(crit)('0'), T_(crit)('1') and I_(leak) in comparison to the DVT-7T cell. A super cut-off CMOS scheme to reduce leakages further has been employed in the paper. A process corner analysis has been done to capture the effect of process variation on the performance of cells.
机译:当噪声增加泄漏时,会使存储在高速缓存(SRAM)中的数据不稳定。因此,提出了一种新颖的具有减少的泄漏并改善了读写性能的TT高速缓存存储单元来解决上述问题。所提出的单元具有其独特的读辅助电路,可提供无SNM的读操作。通过执行差分写操作,它还提供了改进的写能力。通过SPICE仿真,将拟议电池的性能与亚阈值区域内32nm技术节点处的Standard-6T和Dual-V_T 7T(DVT-7T)电池进行了比较。拟议的结构在读取静态噪声容限(RSNM),写入静态噪声容限(VVSNM),数据保持电压(DRV),临界写入时间(T_(crit)),读取电流(I_(读取))和待机泄漏电流(I_(leak))值。此外,它使用三个基于MOS晶体管的锁存结构来减少面积开销。提议的7T结构比标准6T单元改善了RSNM​​,WSNM,Iread和Ileak。类似地,与DVT-7T单元相比,在RSNM,WSNM,I_(读取),T_(临界)('0'),T_(临界)('1')和I_(泄漏)中观察到性能提高。本文还采用了一种超级截止CMOS方案来进一步减少泄漏。已经进行了过程角点分析来捕获过程变化对电池性能的影响。

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