The Effect of Applied Voltage and Operating Pressure on Emitted X-Ray from Nitrogen (N_2) Gas in APF Plasma Focus Device

摘要

In the present work, the effect of applied voltage and operating pressure on behaviour of X-rays emitted from nitrogen gas (N_2) used in APF plasma focus facility is investigated. It was found that the optimum conditions for high emissions of SXR and HXR from the plasma focus (PF) are different. At four applied voltages of 10, 11, 12, and 13 kV, the optimum pressures for SXR and HXR emissions of nitrogen gas (N_2) were obtained. At lower voltages, 10, and 11 kV optimum pressure for SXR emission was 3.5 torr while for HXR emission was 2.5 torr. At higher voltages, 12, and 13 kV, the optimum pressures shift to higher values at 4 and 3 torr for SXR and HXR emissions, respectively. Among the applied voltages, the least intensity of both SXR and HXR was at voltage 10 kV and the most intensity was for 13 kV which confirm with increasing voltage, the intensity of X-ray emission increases. Also the results obtained by images of pin-hole camera were in compatible with the results of detected signals by different filtered Pin-diodes and Scintillation detector. Our results illustrate that the voltage and the pressure are effective parameters in X-ray emission from the PF.