Study of Dense Nitrogen Plasma Irradiation of Aluminum Targets by APF Plasma Focus Device

摘要

The nitridation of Al surfaces is obtained by irradiating nitrogen ions from APF device. The Vickers Micro-Hardness values are improved approximately three times for the nitrided samples comparing to the non-nitri-ded ones. The X-ray diffraction analysis is carried out in order to explore the phase changes in the near surface structure of the metals. The Nuclear Reaction Analysis shows the depth of the nitride composed on the metal surfaces clearly and quantitatively. The results of Scanning Electron Microscopy indicate changes in surface morphology which are the emergence of a smooth and uniform film scattered on the surface of the nitrided specimens.