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首页> 外文期刊>Journal of Electronic Materials >Mercury Interstitial Generation in Ion lmplanted Mercury Cadmium Telluride
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Mercury Interstitial Generation in Ion lmplanted Mercury Cadmium Telluride

机译:离子注入碲化镉镉中的汞间隙生成

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摘要

Junction formation and stability in ion implanted mercury cadmium telluride critically depend on the ability to generate Hg interstitials. The creation of Hg interstitials is found to strongly depend on the preferred lattice position of the element implanted. Elements that substitute onto the cation sublattice create significantly more Hg interstitials than elements that sit interstitially or on the anion sublattice. Recoils from implant damage also contribute to Hg interstitial formation in heavier mass implants (Z ≥ of mass Zn), but appear to have negligible influence on interstitial generation in implants of lighter ions. The combination of implanting ions of large mass and high solubility on the cation sublattice produces strong Hg interstitial sources. Implants with these ions can form deep junctions even in heavily doped substrates. Junction stability is also improved with the stronger interstitial source.
机译:离子注入的碲化汞镉中结的形成和稳定性严重取决于生成Hg间隙的能力。发现汞间隙的产生在很大程度上取决于所植入元素的优选晶格位置。取代阳离子亚晶格的元素所产生的Hg间隙要比间隙地或阴离子亚晶格上的元素多得多。植入物损坏产生的后坐力也有助于在较重的大量植入物中形成汞间隙(质量锌的Z≥Z),但对较轻离子植入物中间隙产生的影响似乎可以忽略不计。大量的离子和高溶解度的离子注入到阳离子亚晶格上的结合会产生强大的Hg间隙源。带有这些离子的植入物甚至可以在重掺杂的衬底中形成深结。间隙源越强,结点的稳定性也越好。

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