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Effects of Surface Porosity on Tungsten Trioxide(WO_3) Films' Electrochromic Performance

机译:表面孔隙率对三氧化钨(WO_3)薄膜电致变色性能的影响

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摘要

In this paper, the correlation between the electrochromic performance and the surface morphology of the tungsten trioxide (WO,) thin films sputtered by dc reactive magnetron sputtering with widely varying target-substrate distances was investigated. It is found that the optical density change (AOD) of films is strongly affected by the target-substrate distance. The coloration efficiency (CE) at 633 nm was also found to be sensitive to the target-substrate distance, with 16 cm~2/C of film sputtered at 6 cm and 50 cm~2/C at 18 cm. X-ray diffraction showed that the crystal structure of films was amorphous. By using atomic force microscope to identify the surface porosity of the sputtered WO_3 films, we found that the film at longer target-substrate distance was rough, porous, and having a cone-shaped columns morphology, thus offering a food electrochromic perfor- mance for opto-switching applications.
机译:在本文中,研究了电致变色性能与目标反应物间距变化很大的直流反应磁控溅射溅射的三氧化钨(WO,)薄膜的表面形态之间的相关性。发现膜的光密度变化(AOD)受目标衬底距离的影响很大。还发现在633 nm处的着色效率(CE)对目标基材的距离敏感,在16 cm / 2 / C的膜上溅射6 cm的膜,在18 cm溅射50 cm / 2 / C的膜。 X射线衍射表明,膜的晶体结构是无定形的。通过使用原子力显微镜确定溅射的WO_3膜的表面孔隙率,我们发现,在较长的靶-基片距离处,该膜是粗糙,多孔的,并且具有圆锥形的柱形,从而为食品提供了电致变色性能。光开关应用。

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