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首页> 外文期刊>Journal of Electronic Materials >Effects of Pd(P) Thickness on the Microstructural Evolution Between Sn-3Ag-0.5Cu and Ni(P)/Pd(P)/Au Surface Finish During the Reflow Process
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Effects of Pd(P) Thickness on the Microstructural Evolution Between Sn-3Ag-0.5Cu and Ni(P)/Pd(P)/Au Surface Finish During the Reflow Process

机译:回流过程中Pd(P)厚度对Sn-3Ag-0.5Cu和Ni(P)/ Pd(P)/ Au表面光洁度之间微结构演变的影响

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摘要

The microstructural evolution between Sn-3Ag-0.5Cu (SAC305) solder and Ni(P)/Pd(P)/Au finish during the reflow process was investigated for various Pd(P) thicknesses (0 μm to 0.6 μm). The reflow process was carried out in a belt-conveying reflow oven with peak temperature of 260°C. In the early stages of the reflow process, the Pd(P) layer either dissolved or spalled in the form of (Pd,Ni)Sn4 into the molten solder, leaving behind an Ni2SnP/Ni3P bilayer on the Ni(P) layer. From the dissolution of the spalled (Pd,Ni)Sn4 particles during the reflow process, the solubility of Pd in the molten SAC305 solder in the reflow process was estimated to be 0.18 wt.% to 0.25 wt.%. Regardless of the ratio of solder volume to pad opening size, the Ni2SnP layer that formed in the early stage of reflow had a significant influence on the subsequent formation and growth of (Cu,Ni)6Sn5 at the solder interface. As the Ni2SnP layer became thicker with increasing Pd(P) thickness, the formation of (Cu,Ni)6Sn5 became increasingly sluggish and occurred only at locations where the Ni2SnP layer was locally thin or discontinuous, leading to a discontinuous morphology of (Cu,Ni)6Sn5. This was attributed to the Ni2SnP layer that became an increasingly effective barrier to Ni diffusion with increasing thickness. Based on the experimental results, this study suggests detailed mechanisms underlying the effects of the Pd(P) thickness on the morphology and growth of the (Cu,Ni)6Sn5 formed during the reflow process.
机译:针对各种Pd(P)厚度(0μm至0.6μm),研究了回流过程中Sn-3Ag-0.5Cu(SAC305)焊料与Ni(P)/ Pd(P)/ Au精加工之间的微观结构演变。回流过程在峰值温度为260°C的带式输送回流炉中进行。在回流过程的早期阶段,Pd(P)层以(Pd,Ni)Sn4 的形式溶解或剥落到熔融焊料中,留下Ni2 SnP / Ni3 < Ni(P)层上的/ sub双层。从回流过程中散裂的(Pd,Ni)Sn4 颗粒的溶解,估计回流过程中Pd在熔融SAC305焊料中的溶解度为0.18重量%至0.25重量%。不管焊料体积与焊盘开口尺寸的比值如何,在回流早期形成的Ni2 SnP层对随后的(Cu,Ni)6 Sn5的形成和生长都有重要影响。 。随着Pd(P)厚度的增加,Ni2 SnP层变厚,(Cu,Ni)6 Sn5 的形成变得越来越缓慢,并且仅在Ni2 处发生。 sub> SnP层局部薄或不连续,导致(Cu,Ni)6 Sn5 的不连续形态。这归因于Ni2 SnP层,随着厚度的增加,它逐渐成为阻碍Ni扩散的有效屏障。根据实验结果,本研究提出了详细的机理,揭示了Pd(P)厚度对回流过程中形成的(Cu,Ni)6 Sn5 的形态和生长的影响。

著录项

  • 来源
    《Journal of Electronic Materials》 |2012年第12期|p.3348-3358|共11页
  • 作者单位

    Department of Materials Science and Engineering, Korea University, Seoul, 136-713, South Korea;

    Department of Materials Science and Engineering, Korea University, Seoul, 136-713, South Korea;

    Department of Advanced Metal and Materials Engineering, Gangneung-Wonju National University, Gangneung, 210-702, South Korea;

    Department of Materials Science and Engineering, Korea University, Seoul, 136-713, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Interfacial reaction; ENEPIG surface finish; Sn-Ag-Cu; Ni2SnP; diffusion barrier;

    机译:界面反应;ENEPIG表面光洁度;Sn-Ag-Cu;Ni2SnP;扩散势垒;

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