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首页> 外文期刊>Journal of Crystal Growth >Dielectric properties of Co-doped Ba_(0.5)Sr_(0.5)TiO_3 thin films fabricated by pulsed laser deposition
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Dielectric properties of Co-doped Ba_(0.5)Sr_(0.5)TiO_3 thin films fabricated by pulsed laser deposition

机译:脉冲激光沉积制备Co掺杂Ba_(0.5)Sr_(0.5)TiO_3薄膜的介电性能

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摘要

Undoped and Co-doped Ba_(0.5)Sr_(0.5)TiO_3 thin films have been fabricated by pulsed laser deposition to explore low dielectric loss and high tunability materials for tunable microwave devices. The crystal structure and surface morphology have been characterized by X-ray diffraction and atomic force microscopy. The influence of Co-doping on lattice parameter of Ba_(0.5)Sr_(0.5)TiO_3 materials has been investigated, and the results show that the variation of lattice parameters with Co concentration is different between targets and thin films. The dielectric loss in the Ba_(0.5)Sr_(0.5)TiO_3 thin films with 0.2 and 1 at% Co are 0.064 and 0.039 at frequency of 100 kHz, respectively, which are lower than that of undoped Ba_(0.5)Sr_(0.5)TiO_3 thin films. The tunability of permittivity of the Ba_(0.5)Sr_(0.5)TiO_3 thin films are 34.6% and 18.7% with 0.2 and 1.0 at% Co-doping at applied electric field 200kV/cm.
机译:通过脉冲激光沉积制备了未掺杂和共掺杂的Ba_(0.5)Sr_(0.5)TiO_3薄膜,以探索可调谐微波器件的低介电损耗和高可调谐性材料。通过X射线衍射和原子力显微镜表征了晶体结构和表面形态。研究了Co掺杂对Ba_(0.5)Sr_(0.5)TiO_3材料晶格参数的影响,结果表明,靶材和薄膜的晶格参数随Co浓度的变化是不同的。 Co和Co含量为1 at%的Ba_(0.5)Sr_(0.5)TiO_3薄膜在100 kHz频率下的介电损耗分别为0.064和0.039,低于未掺杂的Ba_(0.5)Sr_(0.5) TiO_3薄膜。 Ba_(0.5)Sr_(0.5)TiO_3薄膜的介电常数的可调谐性分别为34.6%和18.7%,并且在200kV / cm的电场下共掺杂0.2和1.0 at%的Co。

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