首页> 外文期刊>Journal of Crystal Growth >Dielectric properties and high tunability of (100)- and (110)-oriented (Ba_(0.5)Sr_(0.5))TiO_3 thin films prepared by pulsed laser deposition
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Dielectric properties and high tunability of (100)- and (110)-oriented (Ba_(0.5)Sr_(0.5))TiO_3 thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备(100)和(110)取向(Ba_(0.5)Sr_(0.5))TiO_3薄膜的介电性能和高可调性

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摘要

(Ba_(0.50)Sr_(0.50))TiO_3 (BST) thin films were deposited on Pt(111)/Ti/SiO_2/Si(100) substrates without and with LaNiO_3 (LNO) bufferlayer prepared by pulsed laser deposition (PLD). The BST thin films directly grown on Pt/Ti/SiO_2/Si substrates without and with LNO bufferlayer exhibited highly (100) and (110) orientation, respectively. The dielectric constant of the 800-nm-thick BST films with LNO bufferlayer was 1010 at 1 MHz, which was higher than that of BST film with non-bufferlayer (~851). Also, the tunabilities of BST thin films with (100)- and (110)-orientation were ~63% and ~62%, respectively, at the applied field of 262.5 kV/cm. Improved dielectric constant has been attributed to LNO bufferlayer.
机译:将(Ba_(0.50)Sr_(0.50))TiO_3(BST)薄膜沉积在Pt(111)/ Ti / SiO_2 / Si(100)衬底上,该衬底不具有和具有通过脉冲激光沉积(PLD)制备的LaNiO_3(LNO)缓冲层。在没有和有LNO缓冲层的Pt / Ti / SiO_2 / Si衬底上直接生长的BST薄膜分别显示出高(100)和(110)取向。具有LNO缓冲层的800nm厚BST膜在1 MHz时的介电常数为1010,高于具有非缓冲层的BST膜的介电常数(〜851)。此外,在262.5 kV / cm的外加电场下,取向为(100)和(110)的BST薄膜的可调性分别为〜63%和〜62%。改进的介电常数归因于LNO缓冲层。

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