机译:脉冲激光沉积制备(100)和(110)取向(Ba_(0.5)Sr_(0.5))TiO_3薄膜的介电性能和高可调性
School of Physics and Optoelectric Engineering, Guangdong University of Technology, 729 East Dongfeng Road, Guangzhou 510090, People's Republic of China;
A1. Characterization; A3. Laser epitaxy; B1. Oxides; B1. Perovskite; B2. Dielectric materials;
机译:结构,光学,非线性光学,电介质特性和LA_(0.01)BA_(0.99)TiO_3,SM_(0.5)SR_(0.5)COO_3和SM_(0.5)SR_(0.01)BA_(0.01)BA_的电子结果 (0.99)使用脉冲激光沉积(PLD)技术在石英基板上生长的TiO_3薄膜
机译:脉冲激光沉积制备的掺钾Ba_(0.5)Sr_(0.5)TiO_3薄膜的介电和可调特性增强
机译:脉冲激光沉积可调谐介电Ba_(0.5)Sr_(0.5)TiO_3薄膜的制备与表征
机译:由脉冲激光沉积技术制造的BATIO_3和BA_(0.5)SR_(0.5)TiO_3薄膜的直线和非线性光学性能
机译:通过反应磁控溅射沉积的亚稳态钛(0.5)铝(0.5)铝合金薄膜的物理性能。
机译:脉冲激光沉积法制备MgAl2O4-(Ni0.5Zn0.5)Fe2O4薄膜的磁性和光学性质
机译:脉冲激光沉积制备(1 0 0)-和(1 1 0)-取向(Ba0.5Sr0.5)TiO3薄膜的介电性能和高可调性