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Dielectric properties and high tunability of (1 0 0)- and (1 1 0)-oriented (Ba0.5Sr0.5)TiO3 thin films prepared by pulsed laser deposition

机译:脉冲激光沉积制备(1 0 0)-和(1 1 0)-取向(Ba0.5Sr0.5)TiO3薄膜的介电性能和高可调性

摘要

(Ba0.50Sr0.50)TiO3 (BST) thin films were deposited on Pt(1 1 1)/Ti/SiO2/Si(1 0 0) substrates without and with LaNiO3 (LNO) bufferlayer prepared by pulsed laser deposition (PLD). The BST thin films directly grown on Pt/Ti/SiO2/Si substrates without and with LNO bufferlayer exhibited highly (1 0 0) and (1 1 0) orientation, respectively. The dielectric constant of the 800-nm-thick BST films with LNO bufferlayer was 1010 at 1 MHz, which was higher than that of BST film with non-bufferlayer (∼851). Also, the tunabilities of BST thin films with (1 0 0)- and (1 1 0)-orientation were ∼63% and ∼62%, respectively, at the applied field of 262.5 kV/cm. Improved dielectric constant has been attributed to LNO bufferlayer.
机译:(Ba0.50Sr0.50)TiO3(BST)薄膜沉积在Pt(1 1 1)/ Ti / SiO2 / Si(1 0 0)衬底上,该衬底不具有和具有通过脉冲激光沉积(PLD)制备的LaNiO3(LNO)缓冲层。直接在不具有和具有LNO缓冲层的Pt / Ti / SiO2 / Si衬底上生长的BST薄膜分别具有较高的(1 0 0)和(1 1 0)取向。具有LNO缓冲层的800nm厚BST膜的介电常数在1 MHz下为1010,比具有非缓冲层的BST膜的介电常数高(〜851)。同样,在262.5 kV / cm的外加电场下,取向为(1 0 0)和(1 1 0)的BST薄膜的可调谐性分别为〜63%和〜62%。改进的介电常数归因于LNO缓冲层。

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