Epitaxial LiNb_(0.5)Ta_(0.5)O_3 films on LiTaO_3 and LiNbO_3 substrates grown by thermal plasma

摘要

Single crystal thin films of LiNb_(0.5)Ta_(0.5)O_3 were prepared on (0 0 1)LiTaO_3 and (001) LiNbO_3 substrates by a thermal plasma spray CVD process using metalorganic precursors. The composition and epitaxial quality of the films, deposited at the growth rate of 20―400 nm/min, were evaluated by transmission electron microscopy and X-ray diffractometry. The surface morphology of the films was characterized by atomic force microscopy in relation to the deposition temperature and the substrate surface conditions.