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Scanning tunneling and cathodoluminescence spectroscopy of indium nitride

机译:氮化铟的扫描隧穿和阴极发光光谱

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Indium nitride epilayers grown by metalorganic vapor-phase epitaxy have been studied by cathodo luminescence (CL) spectroscopy, scanning tunneling microscopy and scanning tunneling spectroscopy (STS). A broad CL emission peak centered at 0.8 eV was observed at 80 K. This peak was attributed to an excitonic radiative recombination mechanism as its emission intensity exhibited a super-linear dependence on beam current with a power-law exponent of m = 2. A large spatial variation in the CL emission intensity was ascribed to the presence of threading dislocations, which act as nonradiative recombination centers. A surface band gap of similar to1.4 eV was estimated from STS I-V curves. (C) 2004 Elsevier B.V. All rights reserved.
机译:已经通过阴极发光(CL)光谱,扫描隧道显微镜和扫描隧道光谱(STS)研究了通过金属有机气相外延生长的氮化铟外延层。在80 K处观察到一个以0.8 eV为中心的宽CL发射峰。该峰归因于激子辐射复合机制,因为它的发射强度表现出对束流的超线性依赖性,幂律指数为m =2。A CL发射强度的较大空间变化归因于存在作为非辐射复合中心的穿线位错。从STS I-V曲线估计出与1.4 eV相似的表面带隙。 (C)2004 Elsevier B.V.保留所有权利。

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