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Scaling relationships for analyzing kinetics in GaN epitaxial lateral overgrowth

机译:用于分析GaN外延横向过生长中的动力学的比例关系

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In the epitaxial lateral overgrowth of GaN, mass transport and the effects of crystal-growth kinetics lead to a wide range of observed feature growth rates depending on the dimensions of the masked and exposed regions. Based on a simple model, scaling relationships are derived that reveal the dynamic similarity of growth behavior across pattern designs. A time-like quantity is introduced that takes into account the varying transport effects, and provides a dimensionless time basis for analyzing crystal growth kinetics in this system. Illustrations of these scaling relationships are given through comparison with experiment.
机译:在GaN的外延横向过生长中,质量传输和晶体生长动力学的影响导致了较大范围的观察到的特征生长速率,具体取决于掩膜和暴露区域的尺寸。基于一个简单的模型,得出比例关系,这些关系揭示了整个模式设计中增长行为的动态相似性。引入了类似时间的量,该量考虑了不同的传输效应,并为分析该系统中的晶体生长动力学提供了无量纲的时间基础。通过与实验比较,给出了这些比例关系的图示。

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