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Effects of sputtering power on the properties of ZnO : Ga films deposited by r.f. magnetron-sputtering at low temperature

机译:溅射功率对r.f.沉积的ZnO:Ga薄膜性能的影响低温磁控溅射

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摘要

Gallium-doped zinc oxide (ZnO:Ga) films were prepared oil glass substrates by r.f. magnetron sputtering Lit low substrate temperature. Structural, electrical and optical properties of the ZnO:Ga films were investigated in terms of the preparation conditions. The obtained films were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (0 0 2) crystallographic direction. The transmittance of the ZnO:Ga films in the visible range was over 85%,,. The lowest resistivity and sheet resistance for the ZnO:Ga films were about 3.9 x 10(-4) Omegacm and 4.6Omega/square, respectively. (C) 2004 Elsevier B.V. All rights reserved.
机译:通过射频法制备了掺镓的氧化锌(ZnO:Ga)薄膜。磁控溅射点燃较低的基板温度。根据制备条件研究了ZnO:Ga薄膜的结构,电学和光学性质。所获得的膜是具有六方纤锌矿结构的多晶并且优选在(0 0 2)结晶方向上取向。 ZnO:Ga薄膜在可见光范围内的透射率超过85%。 ZnO:Ga膜的最低电阻率和薄层电阻分别约为3.9 x 10(-4)Omegacm和4.6Omega / square。 (C)2004 Elsevier B.V.保留所有权利。

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