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首页> 外文期刊>Journal of Crystal Growth >Photoreflectance study of InGaAs/AlAsSb quantum wells grown by molecular beam epitaxy
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Photoreflectance study of InGaAs/AlAsSb quantum wells grown by molecular beam epitaxy

机译:分子束外延生长InGaAs / AlAsSb量子阱的光反射研究

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摘要

Room temperature photoreflectance (PR) has been performed on InGaAs/AlAsSb quantum wells (QWs) grown on InP substrates. Using a differential reflectance setup, we observed clear and well-resolved structures, which could be attributed to the interband optical transitions originating in both the QWs and InP substrate. The transition energies measured from the PR spectra agree with those theoretically calculated from the confined levels in the QWs.
机译:在InP衬底上生长的InGaAs / AlAsSb量子阱(QW)上已进行了室温光反射(PR)。使用差分反射率设置,我们观察到清晰且分辨良好的结构,这可能归因于源自QW和InP衬底的带间光学跃迁。从PR谱测得的跃迁能量与理论上从QW的受限能级计算得出的跃迁能量一致。

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