首页> 外文期刊>Journal of Crystal Growth >Formation of step bunching in the epitaxial growth of SrRuO_3 thin films
【24h】

Formation of step bunching in the epitaxial growth of SrRuO_3 thin films

机译:SrRuO_3薄膜外延生长中台阶聚束的形成

获取原文
获取原文并翻译 | 示例
           

摘要

The formation of step bunching in SrRuO_3 epitaxial films has been investigated by exploring the thickness dependence of the morphology. We have observed that pronounced step meandering in the thinner films modifies locally the terrace width. With subsequent growth, areas with double steps form and coexist with other having single steps. The areas with bunching grow and eventually coalesce. We will argue that adatom kinetics is the main driving force for step bunching nucleation.
机译:通过研究形态的厚度依赖性,研究了SrRuO_3外延膜中台阶聚束的形成。我们已经观察到,较薄的薄膜中明显的阶跃曲折局部改变了平台宽度。随着后续的增长,形成了具有双重步骤的区域并与具有单个步骤的其他区域共存。聚集的区域会增长并最终合并。我们将争辩说,原子吸附动力学是步进聚束成核的主要驱动力。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号