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Bulk single-crystal growth of ternary Al_xGa_(1-x)N from solution in gallium under high pressure

机译:高压下镓溶液中三元Al_xGa_(1-x)N的块状单晶生长

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摘要

We have successfully grown bulk, single crystals of Al_xGa_(1-x)N with the Al content x ranging from 0.5 to 0.9. Samples were grown from Ga melt under high nitrogen pressure (up to 10kbar) and at high temperature (up to 1800 ℃) using a gas pressure system. The homogeneity and Al content of the crystals were investigated by X-ray diffraction and laser ablation mass spectrometry. On the basis of the high-pressure experiments, the corresponding pressure-temperature (p-T) phase diagram of Al-Ga-N was derived. The bandgap of the material was determined by the femtosecond two-photon absorption autocorrelation method and is equal to 5.81 ±0.01 eV for the Al_(0.86)Ga_(0.14)N crystals.
机译:我们已经成功地生长出Al_xGa_(1-x)N的块状单晶,其中Al含量x在0.5到0.9之间。使用气体压力系统在高氮压力(最高10kbar)和高温(最高1800℃)下从Ga熔体中生长样品。通过X射线衍射和激光烧蚀质谱法研究晶体的均质性和Al含量。在高压实验的基础上,得出了相应的Al-Ga-N压力-温度(p-T)相图。材料的带隙是通过飞秒双光子吸收自相关方法确定的,对于Al_(0.86)Ga_(0.14)N晶体,其带隙等于5.81±0.01 eV。

著录项

  • 来源
    《Journal of Crystal Growth》 |2009年第16期|3971-3974|共4页
  • 作者单位

    Laboratory for Solid State Physics, ETH Zurich, 8093 Zurich, Switzerland;

    Laboratory for Solid State Physics, ETH Zurich, 8093 Zurich, Switzerland;

    Laboratory for Solid State Physics, ETH Zurich, 8093 Zurich, Switzerland;

    Department of Electrical and Computer Engineering and Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627-0231, USA;

    Laboratory for Inorganic Chemistry, ETH Zurich, 8093 Zurich, Switzerland;

    Department of Electrical and Computer Engineering and Laboratory for Laser Energetics, University of Rochester, Rochester, NY 14627-0231, USA;

    Laboratory for Solid State Physics, ETH Zurich, 8093 Zurich, Switzerland;

    Laboratory for Solid State Physics, ETH Zurich, 8093 Zurich, Switzerland;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. Phase diagram; B1. AlGaN; B1. Growth from solutions; B1. Hiph-pressure crystal growth; B1. Single-crystal growth; B2. Semiconducting III-V materials;

    机译:A1。相图;B1。氮化铝镓;B1。解决方案的增长;B1。高压晶体生长;B1。单晶生长;B2。半导体III-V材料;

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