机译:通过激光分子束外延在SrTiO_3(001)单晶衬底上生长La_(1-x)Sr_xMnO_(3-δ)(x = 0.2、0.3、0.45)薄膜的生长和结构特性
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Republic of Singapore;
School of Engineering, Temasek, Polytechnic, 21 Tampines Avenue, Singapore 529757, Republic of Singapore;
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Republic of Singapore;
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Republic of Singapore;
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Republic of Singapore;
Microelectronics Centre, School of Electrical and Electronic Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798, Republic of Singapore;
A1. High resolution X-ray diffraction; A1. Stresses; A3. Laser epitaxy; A3. Atomic layer epitaxy; B1. Manganites; B1. Perovskites;
机译:反应分子束外延在SrTiO_3缓冲硅衬底上生长的外延La_(0.7)Sr_(0.3)MnO_3薄膜
机译:激光分子束外延生长SrTiO_3衬底上ZnO薄膜的外延特性
机译:通过温度梯度调制生长改善激光分子束外延生长SrTiO_3薄膜的性能
机译:膜厚度对(001)SRTIO_3基板上的单晶BA(Fe_(0.2)Zr_(0.8))O_(3-δ)薄膜的结构和磁性的影响
机译:分子束外延在6个氢碳化硅衬底上生长的氧化镁纳米薄膜的工艺建模与化学计量分析
机译:通过分子束外延生长在GaAs衬底上的铝薄膜中的磁传输
机译:反应分子束外延在SrTiO3缓冲硅衬底上生长的外延La0.7Sr0.3MnO3薄膜