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Growth and characterization of epitaxial Fe_(0.8)Ga_(0.2)/ 0.69PMN-0.31PT heterostructures

机译:外延Fe_(0.8)Ga_(0.2)/ 0.69PMN-0.31PT异质结构的生长和表征

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摘要

Fe_(0.8)Ga_(0.2) films were deposited on bulk single-crystal (0 01) 0.69PMN-0.31 FT substrates by DC magnetron sputtering to make magnetoelectric bilayer composites. Films deposited at temperatures below 600 ℃ were X-ray amorphous. Films deposited at temperatures of 600 ℃ and higher exhibited a single-crystal (0 01) disordered BCC structure. The crystalline FeGa films demonstrate a 45° twisted cube-on-cube epitaxial relationship with the PMN-PT substrates. Heterostructures with an X-ray amorphous FeGa film exhibited zero magnetoelectric response. Heterostructures with a 990 nm epitaxial FeGa film exhibited a large inverse magnetoelectric voltage coefficient of 13.4(G cm)/V.
机译:通过直流磁控溅射将Fe_(0.8)Ga_(0.2)薄膜沉积在块状单晶(0 01)0.69PMN-0.31 FT衬底上,制成磁电双层复合材料。在低于600℃的温度下沉积的薄膜是X射线非晶态的。在600℃和更高温度下沉积的膜呈现单晶(0 01)无序BCC结构。结晶的FeGa薄膜与PMN-PT衬底表现出45°扭曲的立方对立方外延关系。 X射线非晶FeGa膜的异质结构表现出零磁电响应。具有990nm外延FeGa膜的异质结构表现出大的逆磁电电压系数,为13.4(G cm)/ V。

著录项

  • 来源
    《Journal of Crystal Growth》 |2009年第12期|3235-3238|共4页
  • 作者单位

    Michigan Technological University, Department of Materials Science and Engineering, 1400 Townsend Drive, 512 M&M bldg., Houghton, MI 49931, USA;

    Michigan Technological University, Department of Materials Science and Engineering, 1400 Townsend Drive, 512 M&M bldg., Houghton, MI 49931, USA;

    Michigan Technological University, Department of Materials Science and Engineering, 1400 Townsend Drive, 512 M&M bldg., Houghton, MI 49931, USA;

    Oakland University, Department of Physics, 2200 N. Squirrel Road, Rochester, MI 48309, USA;

    Michigan Technological University, Department of Materials Science and Engineering, 1400 Townsend Drive, 512 M&M bldg., Houghton, MI 49931, USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A1. High-resolution X-ray diffraction; A1. X-ray diffraction; A3. Physical vapor deposition processes; B2. Ferroelectric materials; B2. Magnetic materials;

    机译:A1。高分辨率X射线衍射;A1。 X射线衍射;A3。物理气相沉积过程;B2。铁电材料;B2。磁性材料;
  • 入库时间 2022-08-17 13:19:51

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