机译:在6H-SiC衬底上生长的AlN单晶的结构和表面形貌分析
Department of Earth and Environmental Sciences, Crystallography Section, Ludwig-Maximilians-Universitaet Muenchen, Theresienstrasse 41. D-80333 Munich, Germany;
SiCrystal AG, Guenther-Scharowsky-Strasse 1, D-91058 Erlangen, Germany;
SiCrystal AG, Guenther-Scharowsky-Strasse 1, D-91058 Erlangen, Germany;
Department of Earth and Environmental Sciences, Crystallography Section, Ludwig-Maximilians-Universitaet Muenchen, Theresienstrasse 41. D-80333 Munich, Germany;
A1. Substrates; A2. Single crystal growth; B1. Nitrides; B2. Semiconducting materials;
机译:ALN成核层厚度对6H-SiC衬底生长的ALN脱蛋白晶体结构的影响
机译:AlN MOCVD缓冲层在6H-SiC(0001)衬底上生长AlN单晶
机译:使用光霍尔效应测量对在6H-SiC衬底上生长的Al0.2Ga0.8N / AlN / GaN / AlN异质结构进行自洽散射分析
机译:SiC基材从自磨和播种中生长的块状ALN单晶的结构表征
机译:块状AlN单晶衬底上的富铝AlGaN和AlN生长
机译:一些异丁基-126-三芳基-4-(芳基氨基)-1256-四氢吡啶-3-羧酸盐的单晶X射线结构和HIRSHFELD表面分析数据集
机译:使用光霍尔效应测量在6H-SiC基材上生长的Al0.2Ga0.8N / AlN / AlN异质结构的自我一致散射分析
机译:顶部种子溶液法生长Ln(2-x)Ce(x)CuO4(Ln = pr和Nd)单晶的表面分析。