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首页> 外文期刊>Journal of Crystal Growth >Strain compensation techniques for red AlGalnP-VECSELs:Performance comparison of epitaxial designs
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Strain compensation techniques for red AlGalnP-VECSELs:Performance comparison of epitaxial designs

机译:红色AlGalnP-VECSEL的应变补偿技术:外延设计的性能比较

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摘要

We present a strain-compensation design for non-resonantly pumped vertical external cavity surface-emitting lasers for emission in the red spectral range around 665 nm. Here, the VECSEL chip is based on a metal-organic vapor-phase epitaxy grown (Ga_xIn_(1_x))_(0.5)P_(0.5)/[(.Al_xGa_(1_x))_yIn_(1-y)]_(0.50P_(0.5) multi-quantum-well structure with 20 compressively strained quantum wells. By introducing tensile strained quaternary barriers and cladding layers in a 5 × 4 QW design, we could compensate for the compressive strain introduced by the quantum wells. Photoluminenscence measurements of structures with different numbers of quantum well packages reveal a more homogenous quantum well growth due to the strain-compensation technique. Furthermore, with the strain compensation technique, the output power could be increased over 30% compared to our conventional structures.
机译:我们提出了一种用于非共振泵浦垂直外腔表面发射激光器的应变补偿设计,用于在约665 nm的红色光谱范围内发射。在这里,VECSEL芯片基于生长的金属有机气相外延(Ga_xIn_(1_x))_(0.5)P_(0.5)/ [(。Al_xGa_(1_x))_ yIn_(1-y)] _(0.50具有20个压缩应变量子阱的P_(0.5)多量子阱结构,通过在5×4 QW设计中引入拉伸应变的四级势垒和包覆层,我们可以补偿量子阱引入的压缩应变。具有不同数量的量子阱封装的结构由于应变补偿技术而显示出更均匀的量子阱生长,此外,通过应变补偿技术,与我们的传统结构相比,输出功率可以提高30%以上。

著录项

  • 来源
    《Journal of Crystal Growth》 |2013年第1期|208-211|共4页
  • 作者单位

    Institut fur Halbleiteroptik und Funktionelle Grenzfaechen and Research Center SCoPE, University of Stuttgart, Allmandring 3, 70569 Stuttgart, Germany;

    Institut fur Halbleiteroptik und Funktionelle Grenzfaechen and Research Center SCoPE, University of Stuttgart, Allmandring 3, 70569 Stuttgart, Germany;

    Institut fur Halbleiteroptik und Funktionelle Grenzfaechen and Research Center SCoPE, University of Stuttgart, Allmandring 3, 70569 Stuttgart, Germany;

    Institut fur Halbleiteroptik und Funktionelle Grenzfaechen and Research Center SCoPE, University of Stuttgart, Allmandring 3, 70569 Stuttgart, Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    A3. metalorganic vapor phase epitaxy; A3. laser epitaxy; B2. semiconducting ⅲ-ⅳ materials; B2. algalnp; B3. vecsel;

    机译:A3。金属有机气相外延;A3。激光外延B2。半导体ⅲ-ⅳ材料;B2。藻类B3。船只;

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