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机译:非等价原子台阶边缘-InGaN层生长中镓和氮原子的作用
Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, PL-01-142 Warsaw, Poland;
Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, PL-01-142 Warsaw, Poland,Top GaN Ltd., Sokolowska 29/37, PL-01-142 Warsaw, Poland;
Department of Electrical and Computer Engineering, Waterloo Institute of Nanotechnology, University of Waterloo, Ontario, Canada N2L 3G1;
Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, PL-01-142 Warsaw, Poland,Top GaN Ltd., Sokolowska 29/37, PL-01-142 Warsaw, Poland;
Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, PL-01-142 Warsaw, Poland;
Institute of High Pressure Physics, Polish Academy of Sciences, Sokolowska 29/37, PL-01-142 Warsaw, Poland,Top GaN Ltd., Sokolowska 29/37, PL-01-142 Warsaw, Poland;
A1. Crystal morphology; A1. Growth models; A3. Molecular beam epitaxy; B1. Nitrides; B1. Indium gallium nitride; B1. Wurtzite crystals;
机译:等价原子台阶边缘在等离子辅助分子束外延生长InGaN中的作用
机译:镓 - 镓弱键,其在GaN外延生长期间在原子步骤中掺入氮气
机译:氮化镓纳米线中双双层多步生长模式的原位成像原子分辨率
机译:等价原子台阶边缘在等离子辅助分子束外延生长InGaN中的作用
机译:电子增强原子层沉积(EE-ALD),用于室温生长氮化镓,硅和氮化硼薄膜
机译:固态熔体剥落产生的原子薄的镓层
机译:氮化镓纳米线中双双层多步复模的原子分辨率成像