首页> 外文期刊>Journal of Crystal Growth >Fabrication of a P-stabilized GaP (001)-(2×1) surface at very low pressure studied by LEED, STM, AES, and RHEED
【24h】

Fabrication of a P-stabilized GaP (001)-(2×1) surface at very low pressure studied by LEED, STM, AES, and RHEED

机译:LEED,STM,AES和RHEED研究了在非常低的压力下P稳定的GaP(001)-(2×1)表面的制备

获取原文
获取原文并翻译 | 示例
           

摘要

Fabrication of a P-stabilized GaP(001)-(2×1) surface with t-butylphosphine (TBP) at very low pressure (5×10~-7 Torr) has been studied by scanning tunneling microscopy (STM), low-energy electron diffraction (LEED), reflection high-energy electron diffraction (RHEED), and Auger electron spectroscopy (AES). A (3×2) structure is found at small area when a GaP(001)-(2×4) surface was exposed to TBP (70-240L) at 623 K.
机译:通过扫描隧道显微镜(STM),低通量显微镜研究了在非常低的压力(5×10〜-7 Torr)下用叔丁基膦(TBP)制备P稳定的GaP(001)-(2×1)表面的方法。能量电子衍射(LEED),反射高能电子衍射(RHEED)和俄歇电子能谱(AES)。当GaP(001)-(2×4)表面在623 K下暴露于TBP(70-240L)时,在小区域发现(3×2)结构。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号