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首页> 外文期刊>Journal of Crystal Growth >Dislocation density analyses of GaAs bulk single crystal during growth process (effects of crystal anisotropy)
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Dislocation density analyses of GaAs bulk single crystal during growth process (effects of crystal anisotropy)

机译:GaAs块状单晶生长过程中的位错密度分析(晶体各向异性的影响)

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摘要

A computer code was developed for simulation of dislocation density in a bulk single crystal during the Czochralski growth process. In this computer code, the effects of crystal anisotropy such as theelastic constants and slip directions were approximately taken into account by averaging the Young's modulus, the Possion's modulus, the Poisson's ratio and the resolved shear stress along the azimuthal direction. Axisymmetric finite element analysis can be applied to quantitative estimation of dislocation density during single crystal growth process by using such averaging technique together with the Haasen-Alexander-Sumino model as a creep constitutive equation of a single crystal at elevated temperatures.
机译:开发了计算机代码,用于模拟切克劳斯基生长过程中块状单晶中的位错密度。在此计算机代码中,通过平均杨氏模量,位置模量,泊松比和沿方位角方向的解析切应力,可以近似考虑晶体各向异性的影响,例如弹性常数和滑移方向。通过将这种平均技术与Haasen-Alexander-Sumino模型一起用作高温下单晶的蠕变本构方程,可以将轴对称有限元分析应用于单晶生长过程中位错密度的定量估计。

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