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Study of quaternary GaInAsSb alloy by scanning transmission electron microscopy

机译:第四代GaInAsSb合金的扫描透射电子显微镜研究。

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摘要

Quaternary GaInAsSb epilayer was grown by MOCVD on GaSb substrate, and the crystalline state and mismatch relaxation are studied by scanning transmission electron microscopy (STEM), bright field images and convergent beam electron diffraction (CBED) patterns. Mismatch dislocations are generated from the interface, and Lomer 90 dislocations induce surface ridges, and the shift of Kikuchi lines can determine relaxation quantitatively which is similar to the value calculated from electron probe microanalysis.
机译:通过MOCVD在GaSb衬底上生长第四季GaInAsSb外延层,并通过扫描透射电子显微镜(STEM),明场图像和会聚束电子衍射(CBED)图案研究了晶体状态和失配弛豫。界面产生错配位错,Lomer 90位错引起表面隆起,Kikuchi线的位移可以定量确定弛豫,类似于电子探针显微分析计算的值。

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