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首页> 外文期刊>Journal of Computational Electronics >Structural, electronic, and optical properties of AIN_xSb_(1-x_ alloys through TB-mBJ-PBEsol: DFT study
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Structural, electronic, and optical properties of AIN_xSb_(1-x_ alloys through TB-mBJ-PBEsol: DFT study

机译:AIN_XSB_的结构,电子和光学性质(通过TB-MBJ-PBESOL的1-X_合金:DFT研究

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摘要

The objective of this paper is the examination of structural, electronic, and optical properties of binary AlSb, AlN, and their novel ternary AlNxSb1-x alloys (x = 0.25, 0.5, and 0.75), within the full-potential linearized augmented plane wave method based on the density functional theory as implemented in the WIEN2K code. The computed negative formation energies of AlNxSb1-x alloys prove that these compounds are thermodynamically stable. The structural parameters are calculated using the generalized gradient approximation GGA-PBEsol, such as the lattice parameters, bulk modulus, and pressure derivatives, which are in good accordance with both theoretical and experimental data for binary compounds. However, for the ternary alloys, our results are considered as a first prediction. The lattice constants and the bulk modulus are compared with Vegard's law and the linear concentration dependence. The Tran-Blaha-modified Becke-Johnson approach "TB-mBJ" is employed to determine the electronic and optical properties; the results demonstrate that the binary compounds have indirect band gaps (Gamma-X), whereas the ternary AlNxSb1-x alloys exhibit direct band gaps (Gamma-Gamma) semiconductors, with values of 0.472, 0.915, and 1.962 eV for AlN0.25Sb0.75, AlN0.5Sb0.5, and AlN0.75Sb0.25, respectively. The obtained results are reported, discussed, and compared with previous and the experimental data.
机译:本文的目的是检查二元alsb,Aln和新的三元alnxsb1-x合金的结构,电子和光学性质(x = 0.25,0.5和0.75),内部潜在的线性化增强平面波基于Wien2K代码中实施的密度泛函理论的方法。 AlnxSB1-X合金的计算的负片形成能量证明这些化合物是热力学稳定的。使用广义梯度近似GGA-pbesol计算结构参数,例如晶格参数,体积模量和压力衍生物,其既符合二元化合物的理论和实验数据。然而,对于三元合金,我们的结果被认为是第一预测。将晶格常数和大量模量与vegard的定律和线性浓度依赖进行比较。将采用Tran-Blaha修改的Becke-Johnson方法“TB-MBJ”来确定电子和光学性质;结果表明,二元化合物具有间接带间隙(γ-X),而三元AlnxSb1-X合金表现出直接带间隙(γ-gamma)半导体,其值为0.472,0.915和1.962 EV用于ALN0.25SB0。 75,ALN0.5SB0.5和ALN0.75SB0.25分别。报告了所得结果,并与先前和实验数据进行了讨论。

著录项

  • 来源
    《Journal of Computational Electronics 》 |2019年第3期| 791-801| 共11页
  • 作者单位

    Univ Saida Dr Tahar Moulay Technol Lab Commun Saida 20000 Algeria|Univ Saida Dr Tahar Moulay Lab Physicochem Studies Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Technol Lab Commun Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Technol Lab Commun Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Lab Physicochem Studies Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Lab Physicochem Studies Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Technol Lab Commun Saida 20000 Algeria;

    Univ Saida Dr Tahar Moulay Lab Physicochem Studies Saida 20000 Algeria;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Semiconductors; FP-LAPW; TB-mBJ; Optoelectronic;

    机译:半导体;FP-LAPW;TB-MBJ;光电;

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